SCIL Nanoimprint Solutions
We give your surface a function
Many products like smart phones, smart glasses, displays and cars require high-performance nanophotonics for sensing and vision applications.
However, for nanophotonics, conventional lithography techniques have drawbacks like expensive tools, complex processes and low yield.
SCIL Nanoimprint Solutions offers cost effective, robust, high yield manufacturing solutions for the creation of nanometer resolution patterns on a large variety of materials. It can be used to make patterns with feature sizes down to less than 10 nm and overlay alignment below 1 µm.
With the combination of imprint equipment, imprint materials and process know-how SCIL Nanoimprint solutions helps customers to transform their nano-structuring dreams into production reality.
The SCIL Application Center supports in:
- development of the right imprint process based on our customers' input and requirements;
- using optimized equipment and consumables;
- production of wafers that our customers need for their qualification processes
- transfer the SCIL imprint process to the SCIL equipment at your production site
The advantages are clear:
High volume production, Fast development cycles, Solutions that are cost efficient and very reliable