Ushio Europe B. V.

Breguetlaan 53
Oude Meer,  1438 BD

Netherlands
http://www.ushio.eu
  • Booth: B1818


Superior Light Sources Supplier for Semiconductor

At SEMICON booth B1818, Ushio presents top-of-the-line specialist industrial light source solutions for lithography, thermal processing, and surface treatment applications.

Among the UV, visible & IR products on show, visitors will be treated to the European launch of several new Ushio products. These include a new line of LED heating modules, Direct Imaging systems, the UX4 full-field projection mask aligner exposure system, and LPP technology – the most versatile and compact EUV laser-produced plasma source on the market.

Besides new developments, the extended Ushio product portfolio is up for discussion. The Ushio experts, at booth B1818, are prepared to give the answers to your queries on super-high pressure (SH) lamps, SSLS, halogen heating, UVE, and excimer technology. See you there!


 Press Releases

  • SEMICON Europa 2021: Ushio to exhibit wide ranging semiconductor solutions

    Ushio bring solutions from EUV to IR for thermal processing, lithography, and surface treatment applications

    Ushio Europe will present its superior range of semiconductor lighting solutions as co-habiting trade exhibitions, SEMICON Europa and Productronica, get underway at Messe München’s hall B1, booth B1818, from 16–19 November 2021. As a major international semiconductor industry conference and exhibition, SEMICON Europa, in particular, provides a huge networking opportunity for a variety of businesses. Ushio is particularly looking forward to presenting its top-of-the-line specialist industrial light source solutions for lithography, thermal processing, and surface treatment applications.

    Ushio has prepared its full semiconductor product portfolio for the international visitors arriving in Munich. As a prominent manufacturer of industrial light sources, from extreme ultraviolet (EUV) to infrared (IR), Ushio’s Technical Development Team will be on hand to hold demonstrations and give technical advice.

    Ushio to unveil several new products at SEMICON Europa 2021

    At this year’s show, Ushio’s first in-person semiconductor industry event since the pandemic began; visitors will be treated to the European launch of several new Ushio products. Among Ushio’s latest innovations are a new line of LED heating modules, Direct Imaging systems, the UX4 full-field projection mask aligner exposure system, and LPP technology – the most versatile and compact EUV laser-produced plasma source on the market. Some familiar products are on offer too, with the Ushio experts preparing to offer answers to your queries on super-high pressure (SH) lamps, solid state lighting solutions (LEDs & Laser Diodes), halogen heating, UVE, and excimer technology.

  • Oude Meer, the Netherlands (November 2021) – Ushio Europe will supply new “superior light solutions for semiconductor” as two co-habiting trade exhibitions, SEMICON Europa and Productronica, get underway at Messe Muenchen. Ushio’s representatives will be located in hall B1, at booth B1818, from 16–19 November 2021.

    LED Heating Module

    Ushio’s new LED-based, instantaneous heating modules are currently in development for etching, deposition, and ion implantation applications. The result is a compact, LED heating module that boasts rapid and accurate temperature control over a specified area.

    Direct Imaging (DI)

    ADTEC Engineering, an Ushio subsidiary, is in the process of launching their DE-2 and DE-8 exposure systems; adding Direct Imaging (DI) exposure for integrated circuit (IC) substrates and printed circuit board (PCB) processing to the Ushio portfolio. A partnership between ADTEC and Deca has secured optional compatibility with Deca’s Adaptive Patterning™.

     

    UX-4 full-field projection exposure mask aligner

    The UX-4 Series Aligner improves production of micro-electromechanical systems (MEMS), powerful LEDs, and power devices. Developed by the Ushio Inc. R&D team, UX-4 is equipped with a high-quality lens for a large depth of field. Capable of full-field wafer exposure, up to 200 mm in diameter, UX-4 promotes improved productivity, while reducing manufacturing cost.

    LPP

    Ushio’s engineers have reached a critical stage in the development of the brightest-ever, laser-produced plasma (LPP) EUV light source for lithography inspection and medical applications. Compact, easy-to-maintain, and developed by Ushio Germany with Fraunhofer ILT, a liquid tin-coated rotating disc target and a solid-state nanosecond laser combine to create EUV photons. Designed to run at up to 50 kHz, current testing runs at 20 kHz; additionally, plans feature a debris filter and collector to bring EUV light to the intermediate focus point.

    Ushio’s wider portfolio for thermal processes, lithography, and surface treatment

    Aside from the new products mentioned above, Ushio will also be bringing along representatives to share their knowledge on: SH Lamps; Solid State Lighting; Linear and Bent IR Lamps; IR Twin Tube Lamps; Excimer: Hyper V-ST & 222 nm exposure.

    As the world of face-to-face meetings is making a comeback, the Ushio team looks forward to welcoming visitors to SEMICON Europa, hall B1, booth B1818. In the meantime, Ushio, the superior light solution supplier for semiconductor, is waiting to discuss your needs at www.ushio.eu/contact.


 Products

  • DE-2 Next generation Direct Write Exposure System
    DE-2 W300 for 300mm (12”) Wafer (New) DE-2 P600 for 600 × 600mm Panel (December 2021 Debut) ● Fan-Out WLP&PLP ● Minimum Line/Space = 2/2μm imaging ● Overlay accuracy ≦ 1μm ● Optional Deca’s Adaptive Patterning ™...

  • ADTEC Engineering, Ushio’s lithography subsidiary, is launching the DE-2 and DE-8 exposure systems at SEMICON Europa 2021. This allowed Ushio to add complete solutions for Direct Imaging (DI) Exposure for integrated circuit (IC) substrates and printed circuit board (PCB) processing to its portfolio. This also brings the partnership between ADTEC and Deca to the table, which will facilitate compatibility with Deca’s Adaptive Patterning™ technology.

    Alongside Ushio’s large suite of steppers for MEMS, advanced packaging, and LCD manufacturing, ADTEC Engineering itself recently began expansion of its production site to keep up with growing demand from the lithography sector. Feel free to approach our colleagues at SEMICON Europa 2021, to discuss the options available to you for the DE-2 and DE-8 models.

    Key Features: DE-2 Next Generation Direct-Write Exposure System

    • DE-2 W300 for 300 mm wafers; DE-2 P600 for 600 mm x 600 mm panels
    • Maskless Direct Imaging for fan-out WLP & PLP and high-precision packaging
    • Minimum Line/Space = 2/2 μm imaging capability
    • Overlay accuracy ≦ 1 μm
    • Optional: Deca’s Adaptive Patterning™ connectivity

    Contact:

    ADTEC Engineering Co., Ltd.

    Sales Dept., WLP Exposure Systems Div.
    Phone: +81-(0)3-6369-9805
    E-Mail: [email protected]

  • 222 nm – novel exposure opportunities
    Novel 222nm light sources allows selective lithography process without use of a mask. This allows lower system cost and also offer homogeneous irradiation. USHIO's technology offers mercury free environmentally friendly light source....

    • Novel 222nm light sources allows selective lithography process without use of a mask.  This allows lower system cost compared to other UV-C sources and also offer homogeneous irradiation.  USHIO's technology also offers mercury free environmentally friendly light source which enables instant On/Off.
  • LPP (EUV)
    Compact and versatile rotating Sn disc target LPP source....

  • The laser-produced plasma (LPP) EUV source is developed at Ushio Germany in cooperation with Fraunhofer ILT. The source utilizes a rotating disc target coated with liquid tin and a solid-state nanosecond laser. Its compact design has a potential to provide EUV photon to various applications. The source was designed to run at up to 50 kHz and the current tests are underway at 20 kHz. The source has a debris filter and a collector so that the focused EUV light is available at the intermediate focus point. At Semicon, the latest update on the development work will be presented. 

    After entering the field of laser-produced plasma (LPP), Ushio has managed to create the brightest-ever EUV light source. With this achievement, Ushio has announced a new product, which is currently under development, for lithography inspection and medical applications. Despite breaking EUV luminosity records, Ushio’s LPP remains compact, versatile, and easy to maintain.

    The laser-produced plasma (LPP) EUV source is being developed at Ushio Germany, in cooperation with Fraunhofer ILT. The source utilises a rotating disc target coated with liquid tin and a solid-state nanosecond laser. The compact design has a potential to provide EUV photons to various applications. The source was designed to run at up to 50 kHz, with current tests running at 20 kHz; additionally, the designs feature a debris filter and collector so that focused EUV light is available at the intermediate focus point.

    Key Features: Brightest LPP-EUV Light Source

    • Rotating liquid-tin covered disc target
    • Easy-operation
    • Small emission size: 100 x 45 mm2 (at plasma)
    • Stable output for hours/days
    • Tin spectrum (l: 13.5 nm)
  • New LED Heating Module (UD)
    Only available working LEd heating solution in the market. (Under development) Instantaneous heating possible in a fraction of a second....

  • Ushio’s new LED heating modules are currently under development, but keeping to a theme of collaboration, the opinions and needs of potential customers are always at the front of the minds of Ushio engineers. Having already created a module that allows almost instantaneous heating in a fraction of a second, Ushio has mainly included features useful to customers interested in etching, deposition, and ion implantation. Those features have resulted in a compact, cost-effective LED heating module that boasts rapid and accurate temperature controls over the selected treatment area only.

  • UX-4
    Full-field projection mask aligner exposure system optimised for CMOS, MEMS and other 3D structural device manufacturing....

  • Ushio presents its expertise in full-field projection exposure lithography tools, with the UX-4 Series Aligner improving production of micro-electromechanical systems (MEMS), powerful LEDs, and power devices.

    Developed by the talented Japanese Ushio R&D team, UX-4 is equipped with a high quality lens for a large depth of field. Capable of full-field exposure of wafers up to 200 mm in diameter, UX-4 technology promotes a substantial improvement in productivity, while significantly reducing the cost of manufacture. With an optical irradiation system developed in-house, a high degree of homogeneity is ensured thanks to Ushio’s super high-pressure UV lamps (500 W ~ 35 kW). Designed in collaboration with device manufacturers, in response to their increasingly diverse needs, Ushio SH lamps are a highly-acclaimed tool in the litho-patterning industry.

    Key Features: UX-4 Series Aligner

    • Mask Damage-free: No mask-wafer contact throughout the treatment process.
    • Full-Field Projection: Entire surface is treated in one shot, unlike other systems which require multiple shots due to their ‘stepper’ technique.
    • Three-Dimensional Exposure: Large depth of focus. High resolution treatment on both top and bottom of the step, unlike with proximity/contact aligners and steppers.
    • Thick-Film Resist Support: No mask-wafer sticking issues with thick-sticky resist. A problem long associated proximity and contact aligners.
    • Proximity Aligner Mask Diversion: No special mask is required, customised contact aligner masks can be used.

    Intended Applications for UX-4 Full-Field Projection Aligner

    • Acceleration Sensors
    • BAW Filters
    • Crystal Oscillators
    • Diodes
    • IGBT
    • Inductors
    • Inkjet Heads
    • LEDs
    • MEMS
    • MMICs
    • MOS-FETs
    • Passive Components
    • Power Amps
    • Power Semiconductors
    • RF Devices
    • SAW filters
    • Sensors
    • Solar Cells
    • Thyristors
    • And many more...

  • SH Lamps, Solid State, IR&UV Lamps, Excimer
    Ushio is the world’s top supplier of IR, UV, super-high pressure (SH) lamps, LEDs, Laser Diodes, excimer solutions...

  • SH Lamps

    Ushio is the world’s largest supplier of super-high pressure (SH) lamps and commands a global reputation for high-quality, cutting-edge technology. Ushio is a named authorized brand of many top equipment manufacturers.

    Solid State Lighting

    • From UV to IR, Ushio is well-known for its fully in-house LED and Laser Diode manufacturing division. With an extensive collection of standard and customisable products, including the leading Ushio Epitex LED brand, Ushio is able to meet the needs of even the most innovative and unexpected ideas.

    Linear and Bent IR Lamps

    Infrared Twin Tube Lamps

    Excimer

    • Hyper V-ST: High-power compact excimer unit for surface activation and treatment. A compact, convenient, and cost-effective module with optional N2 purge.
    • 222 nm excimer lamps: Novel 222 nm exposure, which brings homogeneous irradiation without an optical system, enables higher wafer processing speeds (6” to 12”). Ushio’s instant on and off excimer di-electric barrier discharge lamps are mercury-free, and therefore, environmentally friendly.
    • Find out more about excimer on Ushio Europe’s Excimer: The Technology Explained page.

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