The AS-One RTP system has been specially developed to meet the requirements of universities, research laboratories, quality control and small-scale production. The high reliability guarantees low cost of ownership.
The clam shell style design of the process chamber gives full access to the bedplate and provides easy loading and unloading of the wafers and practical thermocouple installation. The AS-One can receive a turbo molecular pumping unit in order to provide ultra-clean and oxygen-free process environment.
The cold wall chamber and extended temperature range provides outstanding process capabilities including annealing, dry and wet oxidation, nitridation, selenization, sulfurization, RTCVD of graphene and h-BN as well as ALD of Al2O3, ZnO and other materials.
The machine can be used for a wide range of applications including optoelectronics, MEMS, power components (SiC, GaN), etc.