Vistec Electron Beam GmbH

Ilmstrasse 4
Jena,  07743

  • Booth: B1473

We understand E-BEAM!

As a long-standing equipment supplier, Vistec Electron Beam GmbH is providing leading technology solutions for advanced electron-beam lithography. Based on the Variable Shaped Beam (VSB) principle, the electron-beam lithography systems are mainly utilized for: semiconductor manufacturing applications and advanced research as silicon direct write, compound semiconductor, silicon photonics, mask making as well as integrated optics and several new emerging markets.

The company’s roots go back to Carl Zeiss Jena when the first commercial Variable Shaped Beam system was introduced in the 1970s.

The company is located in Jena, Germany. In addition to its production facility in Germany, Vistec Electron Beam maintains service and support centers in Western Europe, Taiwan and the United States.


  • Vistec SB254
    This electron-beam writer represents the evolutionary development of the successful and field-proven Vistec SB250 series. The Vistec SB254 VSB principle enables further throughput improvement and a resolution below 20nm (HSQ)....

  • The Vistec SB254 electron beam lithography system is a universal and cost-effective tool for both direct write and mask making applications to allow the customers to react quickly to market demands.

    With its 210 x 210mm stage travel range it is the ideal tool for exposing masks up to 7 inch and wafers up to 200 mm diameter.

    The concept of the SB254 enables handling and exposure of transparent and non-transparent compound semiconductor materials. 

    The small cleanroom footprint and the fully automated substrate handling as well as the state of the art operating and data preparation software will convince you of the excellence of the SB254 being part of the modular toolset Vistec is offering to its customers from the industry and applied research sector.

    The field-proven VSB (Variable Shaped Beam), "Write-on-the-fly" and Vector Scan writing modes as well as the 50keV shaped-beam column are further highlights of the SB254 lithography tool.

  • Vistec SB3050 series
    The Vistec SB3050 series - now with a Cell Projection option - is our commitment to semiconductor manufacturing professionals....

  • Designed to meet the challenges of direct patterning down to the 32nm technology node, it features Variable Shape Beam (VSB) technology with vector scan and continuously moving stage principles for throughput optimization.

    Our industry proven 300mm design concept has been successfully utilized in more than 10 installations worldwide.

    The Vistec SB3050 series combines state of the art substrate handling with a high-precision stage system and a sophisticated electron-optical 50 keV column specifically developed to ensure excellent resolution performance.

    Thanks to the production-compatible Graphical User Interface (GUI) the Vistec SB3050 can be easily integrated into automated production environments (CIM). Being capable of exposing both masks (including templates) and wafers, the SB3050 exposure tools are the ideal bridge to next generation technology nodes.

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