Industrial equipment

JSW AFTY Corporation.(Japan)

In April 2014, JSW Afty Co., Ltd. took over the business from MES Afty Co., Ltd. regarding the manufacturing and sales of "ECR Deposition System", "ALD System“, "Annealing System" and the related services. They have started as a group of the “Japan Steel Works (JSW)”.

JSW AFTY provides the value for their customers with these systems as well as the consistent services from development to post-sale service.

DEX-6400C

ALD-ECR Hybrid System ALD-ECR

This system combines ECR plasma of high dense, high irradiated vapor reaction and ALD which is assumed to be ultimate CVD pursuing ideal surface reqaction. You can use process with both or either of above two function.
Both ECR and ALD are good for film deposition of superior withstand voltage. And ECR plasma and ALD show its excellent performance for MOS surface control and coverage control respectively.
Deposition system for experimental development, which can make continuous deposition of precise film by ECR and excellent coverage film by ALD with in-situ. Substrate size: Max. φ4

AFTEX-9800

Solid source ECR plasma deposition system

The solid source ECR plasma deposition system produces ultra-thin films at low temperatures with minimal damage. Over 100 machines are currently in operation at production facilities. The AFTEX9800 was developed in response to strong demand from the industry for a system designed accommodate up to three ECR plasma sources for 8-inch substrates.
The AFTEX9800 significantly boosts productivity by using three ECR plasma sources, as maximum, for deposition, while also achieving impressive space savings by redesigning deposition module (now 30% smaller). In addition, the newly developed built-in spectroscope (optional extra) makes it possible to monitor parameters such as film thickness and refractive index dispersion.

AFTEX-6200

Solid source ECR plasma deposition system

The solid source ECR (Electron Cyclotron Resonance) plasma deposition system creates high-quality thin film at low temperatures with minimal damage by forcing a direct reaction between a low-pressure, high-density ECR plasma flow and sputtering particles from a solid source (target) positioned in the outlet path of the plasma flow.
The AFTEX-6200 upgraded the hardware and software for vastly improved operating performance and reliability from former type, AFTEX-6000(two ECR plasma sources, fully automated transport and formation processes), while the basic features has remained unchanged.
Instrumentation has been completely redesigned and now includes features such as detailed error messages and recipe backup. In addition, the newly developed spectroscope (optional extra) makes it possible to monitor deposition chamber parameters such as film thickness and refractive index dispersion.

AFTEX-2300

New experimental R&D system

The AFTEX-2300 is an inexpensive system developed specifically for thin film research and associated applications.
This low-cost solution delivers excellent performance standards thanks to the microwave branch coupling type ECR ion source, load lock mechanism and turbo molecular pump. It is ideal for research into oxide and nitride thin films.

 

  • Branch coupling ECR plasma source provides consistent and stable operation over the long term while preventing film adhesion at the microwave introduction port.
  • Improved environmental design eliminates the need for exhaust gas treatment by ensuring a direct reaction between solid source sputter particles and the low-energy high-current ECR plasma flow.(typically oxygen or nitrogen)
  • A combination of the turbo molecular pump for extracting exhaust gases from the deposition chamber and the load lock mechanism ensures a clean environment for membrane deposition.
  • Automated vacuum exhaust extraction sequence, multiple interlock mechanisms.

 

<Option>

  • DC sputtering
  • Substrate heating
  • Substrate bias
  • Microwave auto tuner

Sumitomo Heavy Industries, Ltd.(Japan)

The company is a general machinery manufacturer largely deploying its business operations worldwide in various fields including leading-edge precision machinery, ship building, fields related to energy and the environment, and the medical field. Its Mechatronics Division designs and manufactures the Laser Annealing System used in the manufacturing process of power semiconductor, and is considered as a key device necessary to achieve a low carbon society.

Laser Annealing System for Silicon wafer (IGBT) Model: SWA-90GDA

  • 2-wavelength annealing with solid state laser double pulse method added by long-wavelength laser
  • Activation up to a depth of 7 μm
  • Pulse energy stability:> 1%
  • Processing backside is possible without affecting surface side(pattern side).>100℃
  • Handling thin wafer of 70μm

Laser annealing system for SiC Wafer Model: SWA-20US

  • High Throughput
  • Uniform irradiation of the whole wafer surface by a top hat type beam
  • Atmosphere control

A·S·A·P Co.,Ltd.(Japan)

ASAP supplies processing equipment for silicon semiconductors, compound semiconductors and micromachines. Equipment is tailored to client requirements. Compound semiconductor equipment, for instance, is often custom-designed to specific requirements such as smaller external dimensions or handling stability, while micromachine equipment can be customized to work with high-viscosity chemicals.

High pressure jet type lift-off machine

The custom design by ASAP for 2-inch machine is able to reduce 50% of footprint (NB: In-house analysis) compared to the machine that is originally made for 6-inch diameter system at first and is repaired to 2-inch diameter system by changing modified transport jig.

Resist coater / developer

Fully automated coating, developing and baking processing of photoresists, polyimides, OCD and PBF.

High-reliability wafer feed robot for carrying wafers between units. Cleaning processes such as edge rinse and back rinse. Mounted HMDS steam substitution unit. (Option) A compact format designed for 2 to 4-inch diameter compound substrates.

Opto System Co., Ltd.(Japan)

Founded in 1980, Opto System is engaged primarily in the design, manufacture and distribution of testing, inspection and process machines used in the development and mass production of photosemiconductors (light receiving and light emitting devices). Opto System also produces made-to-order equipment tailored to client specifications and enjoys a solid reputation in Japan and around the world for quality and cost efficiency. The recently released laser scriber for high-intensity LEDs is an advanced unit featuring a unique light source and process method designed for rapid chip processing with minimal particles and debris levels.

Laser scriber Model: WSF 4200X

The Model WSF4200X uses a picosecond laser to produce chips from wafers via a special method (patent pending) that is different to conventional processes.

Nissin Giken Co., Ltd.(Japan)

Founded in September 1974, Nissin Giken supplies a range of machines and equipment in three main areas: new metal materials, crystal materials, and EB and power sources. Nissin Giken has established a solid reputation in heat processing systems with high-frequency power sources, and also supplies vacuum deposition EB sources and power sources in both high-performance and basic configurations. With many years of experience, Nissin Giken boasts proven technology and expertise for both research and production applications.

Czochralski (CZ) type large-diameter sapphire pulling system

  • Space-saving design, low energy consumption
  • Pulling sizes from 4-inch to 8-inch
  • Simple procedure for replacing the crucible

Sublimation type SiC and AIN monocrystal growing system

  • Heating to 2,500°C in inert gas conditions
  • Low-maintenance heater unit
  • Control system based on proprietary software

JSW AFTY Corporation.(Japan)

In April 2014, JSW Afty Co., Ltd. took over the business from MES Afty Co., Ltd. regarding the manufacturing and sales of "ECR Deposition System", "ALD System“, "Annealing System" and the related services. They have started as a group of the “Japan Steel Works (JSW)”.
JSW AFTY provides the value for their customers with these systems as well as the consistent services from development to post-sale service.

ALD (Atomic Layer Deposition) Systems

In atomic layer deposition, molecules from the precursor are absorbed into the surface of individual atomic layers that are created via a repeating cycle of purging with inert gas to remove surplus molecules followed by deposition with reactive gases, then another inert gas purge to remove surplus molecules and so on. In this way, the atomic layers are built up in sequence.
In the deposition reaction, the self-limiting nature of the surface chemical reaction contributes to uniformity control across the atomic layer to enable high-quality thin film deposition with excellent uniformity, film control and step coverage characteristics.
Choose from a variety of different configurations ranging from dedicated plasma type and wafer process research versions to large substrate models.
Two sets of equipment specifications are available to suit all requirements: research and development models suitable for substrates of diameter up to 150 mm, and the 370 x 470 mm models. Please inquire about using a demonstration model for sample processing.

Annealing systems

Production of flat panel displays (FPD), particularly liquid-crystal displays, necessitates increasingly advanced manufacturing systems with more powerful features and ever higher standards of quality and safety.
At JSW AFTY, we design high-quality production solutions based on our longstanding expertise in the production sector as part of an integrated client liaison production structure that ensures that client requirements are faithfully reflected at all stages from design through to commissioning. JSW AFTY boasts extensive experience in the design and installation of high-volume production lines.
As with ion implantation equipment, we are now developing G5.5 (1,300 x 1,500 mm) and G6 (1,500 x 1,850 mm) configurations to cater to the fast-growing small and medium-sized display segment.
We also have a 730 x 920 mm substrate demonstration model that can be used for sample processes.

YAC DENKO Co., Ltd.(Japan)

On January 1, 2012, Denko Co., Ltd. changed its name to YAC Denko Co., Ltd. The company was originally established as Kokusai Electric Works, Ltd. in 1961 (Heisei 36) and initially engaged mainly in the manufacturing of electric heaters and sales of various types of heat treatment furnaces for different kinds of metals. The company has made a great contribution to the electronics industry with its longtime knowhow and proprietary technology in heat treatment based on far-infrared radiation as the basis of energy transfer.
Its heat treatment technology that features far-infrared radiation as its core technology, has been attracting attention fromindustrial circles as a uniform and high-precision heat treatment method. Further, the company has been advancing air current control technology and clean energy technology as its second and third technological cores and, together with far-infrared heat treatment technology which is a non-contact, clean heat source, they are used for precision components which are highly sensitive to particle (fine grain dust) contamination.

Vertical heat treatment equipment for FPD manufacturing

Single wafer multistage heating equipment.
This product is contributes to yield ratio improvement in the array process, cell process and panel process for LCD manufacturing.

Belt transfer furnace

This product has a wide variety of applications because of its stable atmosphere control and mild atmosphere heating. It reduces electricity drastically by causing radiant pad heaters and muffles to stick together.
Sublimate emitted out of the burnout part flows against the driving direction, so it is structured to prevent foul gasses from flowing back to the firing zone.

High-efficient far-infrared heater

Infrastructure panel heater

This product is a panel-type far-infrared heater which can receive electricity of high energy density.

High-efficient far-infrared heater

Radiant pad heater

A flexible type far-infrared heater with insulator knitted.

High-efficient far-infrared heater

Infrastructure unit heater

A unit-type far-infrared heater with a wide emitting surface.

TAKANO CO.,LTD.

TAKANO CO., LTD. has been transferred all business operation related with FPD Exposure System (TME Series) from TOPCON Corporation since July 31, 2018. All operation & maintenance services related with TME Series will be continued by TAKANO CO., LTD.

FPD Exposure system TME series

It is a proximity exposure system for LCD.

NEWLONG SEIMITSU KOGYO CO., LTD.(Japan)

NEWLONG SEIMITSU KOGYO CO., LTD. pursues unlimited possibilities for screen printing. We are committed to develop new technologies and new products in order for our customers that the screen printing method can contribute customers’ various product development and production processes.
The latest machinery and various and skilled technique create high quality printing systems.

Screen printing machine

LS-150TVA

  • Print area(mm):150×150
  • Frame dimensions(mm):320×320
  • Table dimensions(mm):230×230
  • Machine size(mm):590×1120×1210
  • Power supply(AC):100V1Φ

Screen printing machine

LS-34GX

  • Print area(mm):300×400
  • Frame dimensions(mm):550×650 / 650×750 / 750×750
  • Table dimensions(mm):450×550
  • Machine size(mm):1,785×1,120×,1540
  • Power supply(AC):200V3Φ

Screen printing machine

LZ-2300STVA

  • Print area(mm):2,330×2,330
  • Frame dimensions(mm):3,500×3,500
  • Table dimensions(mm):2,600×2,700
  • Machine size(mm):7,500×3,750×2,900
  • Power supply(AC):200V3Φ

On-chip Biotechnologies Co., Ltd.(Japan)

On-chip Biotechnologies Co.,Ltd. is a development and manufacture company of the Flow Cytometer, and the first in the world to use microfluidic chip based Cell Sorter. Cell sorter is an instrument that collects a specific type of cells from a mixture of cells. This technology was first developed over 40 years ago, but Only in recent years people begin to realize that the sorting process cause damage to cells.
However, this cell sorter allows for damage-less sorting by collecting cells in their own unique technique.
The core of the technology is this microfluidic chip.
In this device, using hydrodynamic focusing of the sheath liquid, they align cells in a single line, and detect each cell passing using lasers.
Cells would flow straight to the waste reservoir, but whenever it detects the cell of interest, a liquid pulse is generated, and this pulse pushes the target cell across.

By using this method, we eliminated all the damaging steps involved in conventional sorters, and thus we can collect cells without any damage.
This sorter is compact enough to fit inside a biosafety cabinet.
Using our sorter, people can now handle cells that they were not able to collect using other sorters.
For example, just like in this figure here, we can collect neurons that would die if we put them in a conventional sorter. Also, we can collect cells without changing its morphology.

Micro flow channel technology

LS-150TVA

On-chip Sort performs cell sorting incorporated a disposable microfluidic chip. All reservoirs, channels, and detection parts are on the chip, and the chip is used to sort cells without causing damage.
The material used for the disposable chips is COP. The size of chip is 6.0 cm × 4.0 cm, and also the flow channel is shaped 80 μm (width) x 80 μm (depth). All reservoirs, channels, and detection parts are on the chip, and the chip is used to sort cells without causing damage.
One of the most damaging step involved in conventional sorter is the collision to the liquid surface. On-chip’s sorting method does not involve this kind of collision. Even if we increase the pressure to increase the processing speed, it will still be about one one-hundredth. There is also no contamination between samples and no contamination with the equipment. The chips are available in sterilized or non-sterilized type. They also have wider flow channel chip and it is possible to sort any cells such like up to 150μm.
The key points are the fact that we are using a microfluidic chip for sorting, and the fact that the risk of damaging the cells is minimal. Also, the small size, sterile sorting and handling of any liquid as sheath are considered as other advantages.

Hitachi, Ltd.(Japan)

Hitachi has been providing large-scale automated induced pluripotent stem (iPS) cell culture equipment, cell processing facilities (CPFs), manufacturing execution systems(MES), and biosafety cabinets among other products to pharmaceutical companies and research institutes, and has developed a value chain to meet a variety of customer needs in the regenerative medicine and cell therapy industry.

Stable supply of high quality cells by automated cell culture process

Automation reduces the frequency of routine process and ensures same quality as experts.

  • Mass production of adherent cells (ex. IPS cells)
  • Automation of cell expansion and differentiation
  • Sterile environment by single-use closed module

Cyfuse

Cyfuse Biomedical is a Tokyo-based biotechnology startup specializing in the fabrication of 3D human tissues and other advanced cellular products for regenerative medicine as well as for drug screenings by using Micro Needle Array Technology (MNAT) which Cyfuse has developed. MNAT makes 100-percent-cell-only bio 3D fabrication possible by tapping into cells’ natural ability to aggregate, and represents a major innovation in bio 3D printing in that bio 3D printers in today’s market require some types of artificial ingredients, such as gel or synthesized polymer for fabrication. MNAT enables the fabrication of cellular constructs in diverse shapes and sizes from the patient’s own cells with no artificial additives, boosting expression of cell function and graft survival rate, and lowering rejection risks after the transplantation.
Cyfuse aims to provide novel solutions for the treatment of damaged tissues and organs by bringing together its knowhow in biotechnology and high-level engineering.

Bio 3D Printer S-PIKE®

S-PIKE is new Bio 3D Printer which Cyfuse Biomedical invented and developed. S-PIKE uses single fine needles to hold spheroids (aggregated cells) in place until they naturally fuse after fabrication of cellular constructs in diverse shapes and sizes. Three features.

 

  • 1. Compact Configured to be small and light enough for installation within a safety cabinet.
  • 2. Usability The original software pursues usability to allow flexible designs in various shapes and pitches.
  • 3. User First Compact design, flexible software and economic merit will help to start your development.

 

S-PIKE will provide the practical new outcome in the field of regenerative medicine and drug discovery.

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