ASML Netherlands BV

De Run 6501
Veldhoven,  NL-5504 DR

Netherlands
http://www.asml.com
  • Booth: C1268

We measure a machine’s life in decades, not years. Almost every single ASML lithography system sold is still in use at a customer fab.Before EUV, before immersion, and even before our TWINSCAN systems, there was the PAS.


In 1991, seven years after ASML was founded, we launched the PAS 5500, which turned out to be our breakthrough platform. This system was able to dramatically reduce manufacturing times for our customers, and its modular design enabled them to produce multiple generations of advanced chips using the same system.

The PAS 5500 is a versatile machine that can be adapted for many new markets and special applications. For example, by adding front-to-backside alignment, the system can be optimized for MEMS chips such as accelerators (the chips that can tell which way is ‘up’). The system can also be adapted for ‘through-silicon via’ (TSV) applications, radio frequency chips, thin-film heads for hard disk drives, or bowed wafer handling for LED applications. Enhancements to throughput and overlay can also reduce costs in high-volume manufacturing.

Read more about our PAS 5500 Platform here.

Contact Us: syed.zaid.ali@asml.com


 Products

  • PAS 5500 Steppers & Scanners
    The PAS 5500 is a versatile machine that can be adapted for many new markets & special applications. For example, by adding front-to-backside alignment, the system can be optimized for MEMS chips such as accelerators....

  • The PAS 5500: a machine with a history

    Before EUV, before immersion, and even before our TWINSCAN systems, there was the PAS.

    In 1991, seven years after the company was founded, we launched the PAS 5500, which turned out to be our breakthrough platform. This system was able to dramatically reduce manufacturing times for our customers, and its modular design enabled them to produce multiple generations of advanced chips using the same system.

    The PAS 5500 is a versatile machine that can be adapted for many new markets and special applications. For example, by adding front-to-backside alignment, the system can be optimized for MEMS chips such as accelerators (the chips that can tell which way is ‘up’). The system can also be adapted for ‘through-silicon via’ (TSV) applications, radio frequency chips, thin-film heads for hard disk drives, or bowed wafer handling for LED applications. Enhancements to throughput and overlay can also reduce costs in high-volume manufacturing.

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