Vistec Electron Beam GmbH

Ilmstrasse 4
Jena,  07743

Germany
https://www.vistec-semi.com
  • Booth: C1459


We understand E-BEAM!

As a long-standing equipment supplier, Vistec Electron Beam GmbH is providing leading technology solutions for advanced electron-beam lithography. Based on the Variable Shaped Beam (VSB) principle, the electron-beam lithography systems are mainly utilized for: semiconductor manufacturing applications and advanced research as silicon direct write, compound semiconductor, silicon photonics, mask making as well as integrated optics and several new emerging markets.

The company’s roots go back to Carl Zeiss Jena when the first commercial Variable Shaped Beam system was introduced in the 1970s.

The company is located in Jena, Germany. In addition to its production facility in Germany, Vistec Electron Beam maintains service and support centers in Western Europe, Taiwan and the United States.

 Products

  • Vistec SB3050-2
    The Vistec SB3050-2 with Cell Projection option is our commitment to semiconductor manufacturing professionals. Designed to meet the challenges of direct patterning, it features Variable Shape Beam (VSB) for throughput optimization....

    • KEY FEATURES

    • 50keV high-resolution electron optics with 1nm writing/address grid
    • 310x310mm stage travel range to ensure full 300mm wafer exposure capability
    • High throughput achieved by the "write-on-the-fly" principle combined with Flexible Stage Speed (FSS)
    • State of the art fully automatic substrate handling with mini environment to satisfy the requirements
      of most advanced resist technologies
    • Wafer Mix & Match with optical lithography supported by production compatible correction methods
    • Integrated monitoring software for all critical process parameters
    • High speed data processing allows fast data generation including flexible Proximity Effect Correction with distributed computing
    • Small clean room footprint < 27m² (SB3050)
    • Cell Projection option for combined use with VSB principle for further throughput improvement

    Check out for more information: Vistec SB3050-2: Vistec - We understand E-Beam. (vistec-semi.com) 

  • Vistec SB254
    The Vistec SB254 electron beam lithography system has been designed as a universal and cost-effective tool for both direct write and mask making applications to allow the customers to react quickly to market demands....

    • KEY FEATURES

    To meet the specific requirements of our customers the following features are optionally available:

    • Various substrate sizes and types supported by fully automated substrate handling incl. substrate pre-alignment
    • Multipass writing
    • MDSP (Mark Detection Software Package) incl. image field metric
    • Layout data preparation station covering up to 256 CPU cores for:
      • fracturing
      • plus additional Proximity Effect Correction (PROXECCO) and fogging correction options
    • Graphical User Interface (GUI) compliant to SEMI E95
    • Address grid down to 1nm

    The Vistec SB254 This electron-beam writer represents the evolutionary development of the successful and field-proven Vistec SB250 series. The Vistec SB254 with cell projection option for combined use with VSB principle enables further throughput improvement and a resolution below 20nm (HSQ).

    Check out for more information: Vistec SB254: Vistec - We understand E-Beam. (vistec-semi.com)

Categories

205 Nanotechnology Equipment and Tools
  • Equipment, Nanotechnology Tools
    • 207 Process Equipment
  • Lithography; Exposure; Aligners; Direct Write Systems; Steppers; Scanners; Nanoimprint
    • 700 Manufacturing Services
  • Calibration & Reference Standards
    • 901 Printed, Organic, Flexible and Large Area
  • Equipment: Systems
  • Services: Testing Institutes

    • Send Email

    Type your information and click "Send Email" to send an email to this exhibitor. To return to the previous screen without saving, click "Reset".

    Loading ...

    :
    :


    Legend
    Available Timeslot
    Scheduled Appointment
    Personal Appointments
    Appointment Request
    Blocked Timeslot
    Restricted Timeslot
    Cancelled
    Declined