DWL 2000 / 4000 GS laser lithography systems are fast and flexible high-resolution pattern generators. They are optimized for industrial-level grayscale lithography and designed for high-throughput patterning of masks and wafers for integrated circuits, MEMS, micro-optic and microfluidic devices, sensors, holograms and security features on banknotes and ID cards.
The Professional Grayscale Lithography Mode enables patterning of complex 2.5D structures in thick photoresist over large areas. With a minimum feature size of 500 nm, a write area of up to 400 mm x 400 mm and optional automatic loading system, DWL 2000 / 4000 GS systems are particularly suitable for wafer-level micro-optics used for telecommunications, illumination and industrial display manufacturing, as well as for device fabrication in life sciences.