NanoSystem Solutions MS-1000 & MS-1100 are the system that designed to detect each type of micro defects with our original technics and latest photolithography system which appears at silicon wafer production line.
Our system scanning area is wafer edge, notch, backside, frontside and inside of wafer.
It detects defect, scratch, crack, chipping, and particle on the wafer edge, nothch, backside and frontside of wafer. The system also detect wafer inner defect which known as Pinhole or Air pocket.
MS-1000 & MS-1100's high speed wafer handling system make one of the best performance as throughput.
"Low CoO" is one of our inspection system's very strong and attractive feature from our this throughput performance.
MS-1000 & MS-1100 have very high performance of throughput compare with competitor's system.
These our features are totally effect on Highly Yield performance for your production line.