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ONTOS Equipment Systems

343 Meadow Fox Lane
Chester,  NH  03036

United States
http://www.ontosplasma.com
  • Booth: B1146

ONTOS Equipment Systems is a supplier of atmospheric plasma machines designed to replace vacuum equipment and wet processing to produce contamination-free, highly-activated surfaces to enhance cost, yield, and throughput in microelectronics manufacturing. Our atmospheric plasma systems are designed for and focused on the semiconductor manufacturing and packaging industry.


 Products

  • ONTOS CLEAN
    The ONTOS CLEAN is a Standalone Atmospheric Plasma. It uses a low temperature glow discharge dielectric barrier plasma. The plasma cavity is designed for both reducing chemistry and oxidizing chemistry....

  • ONTOS CLEAN is a Semiautomated system for Surface Preparation using a patented Atmospheric Plasma with a unique design enabling without any modification using oxidizing or reducing chemistry.

    Ontos performs Cleaning, Eliminates the Organic Contamination, Activates Surfaces and Remove Oxidation.  An Innovative Process applies a gaseous passivation that impedes re-oxidation of the metallic surfaces.

    Versatile Chemistry

    ONTOS CLEAN uses Helium or Argon as a carrier gas. Customers can choose to introduce Oxygen (cleaning and activation), Hydrogen (oxide removal) or Nitrogen (cleaning and PASSIVATION) chemistry.

    Simple, Effective and Safe Process

    • Simple process — no vacuum chamber.
    • Fast — precision x/y/z stage completes process in a few minutes.
    • Downstream radical chemistry only.
    • Ultra-clean – no particle adders or contamination.
    • Safe for devices and personnel.
    • No arc discharges, ions, bombardments, redeposition, or spalling particulates.
    • CMOS safe, compound semiconductor safe.
    • Non-toxic, dry process. OSHA- and EPA-friendly.

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