ONTOS CLEAN is a Semiautomated system for Surface Preparation using a patented Atmospheric Plasma with a unique design enabling without any modification using oxidizing or reducing chemistry.
Ontos performs Cleaning, Eliminates the Organic Contamination, Activates Surfaces and Remove Oxidation. An Innovative Process applies a gaseous passivation that impedes re-oxidation of the metallic surfaces.
Versatile Chemistry
ONTOS CLEAN uses Helium or Argon as a carrier gas. Customers can choose to introduce Oxygen (cleaning and activation), Hydrogen (oxide removal) or Nitrogen (cleaning and PASSIVATION) chemistry.
Simple, Effective and Safe Process
- Simple process — no vacuum chamber.
- Fast — precision x/y/z stage completes process in a few minutes.
- Downstream radical chemistry only.
- Ultra-clean – no particle adders or contamination.
- Safe for devices and personnel.
- No arc discharges, ions, bombardments, redeposition, or spalling particulates.
- CMOS safe, compound semiconductor safe.
- Non-toxic, dry process. OSHA- and EPA-friendly.