Vistec Electron Beam GmbH
We understand E-BEAM!
As a long-standing equipment supplier, Vistec Electron Beam GmbH, Jena (Germany) is providing leading technology solutions for advanced electron-beam lithography. Based on the Variable Shaped Beam (VSB) principle, the electron-beam lithography systems are mainly utilized for industrial and advanced research applications, such as electron-beam direct write in semiconductor manufacturing, including compound semiconductor, direct write mask making as well as photonics and several new emerging markets.
Efficient data processing & extended exposure strategies open up new applications, especially in the field of AR/VR.
Vistec’s technology features automated handling, as well as high flexibility, writing accuracy and productivity and therefore is suitable for prototyping and low volume production.
Vistec Electron Beam´s roots go back to the 1950´s when the company was part of Carl Zeiss Jena where the first electron microscope was developed. In 1974, the first commercial shaped beam system was launched on the basis of fundamental patents.
In addition to its production facility in Germany, Vistec maintains service & support centers in Asia Pacific, USA and Europe.