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Singulus Technologies AG

Hanauer Landstrasse 103
Kahl am Main,  D-63796

Germany
http://www.singulus.de
  • Booth: B1617


SINGULUS offers vacuum deposition systems (Cluster Tools)

SINGULUS TECHNOLOGIES - Thin-Film Coating and Surface Treatment

SINGULUS TECHNOLOGIES develops and assembles innovative machines and systems for efficient thin-film coating and surface treatment processes, which are used worldwide in the Photovoltaics, Semiconductor, Medical Technology, Packaging, Glass & Automotive as well as Battery & Hydrogen markets.

The company’s core competencies include various processes of coating technology (PVD sputtering, PECVD, evaporation), surface treatment as well as wet-chemical and thermal production processes.

SINGULUS TECHNOLOGIES is a renowned manufacturer of advanced thin-film deposition equipment for magnetic sensors (TMR, GMR, AMR), integrated inductors, MRAM, µLED, Advanced Packaging (RDL/UBM), Interconnects, and other semiconductor applications.The cluster tools from SINGULUS TECHNOLOGIES with the brand name TIMARIS offer a complete portfolio of process modules for a variety of applications.


 Press Releases

  • SINGULUS TECHNOLOGIES currently focuses on the development of production equipment for various applications in the semiconductor technology, sensor technology and magnetic layers. In particular, the company is intensively engaged in the area of magnetic sensors, where ultra-thin metallic layer systems are used. In this regard, SINGULUS TECHNOLOGIES offers the TIMARIS platform, which enables customized manufacturing systems through the combination of various process modules. Based on the proven TIMARIS machine platform, SINGULUS TECHNOLOGIES introduced the enhanced TIMARIS III cluster tool, which meets the requirements of automated 300 mm wafer manufacturing in traditional semiconductor technology. A significant customer order acceptance already took place in early 2023 after the system was sold to an important customer. The company strives to win additional customers in the semiconductor market with this advanced machine platform. In this context, SINGULUS TECHNOLOGIES operates in a challenging competitive environment with international competitors within the semiconductor application area.

     


 Products

  • TIMARIS Nano Deposition System
    The TIMARIS cluster tool is dedicated for the deposition (PVD sputtering/PECVD) of ultra-thin metallic and insulating films....

  • TIMARIS III Cluster Tool

    SINGULUS has already established and qualified the second generation of the TIMARIS PVD Cluster Tool platform in the market and is offering a complete portfolio of process modules for different applications.

    As of today, more than ten process modules are available to configure a TIMARIS system according to customer needs. These modules include the Multi-Target-Module (MTM), Oxidation-Process-Module (OPM),
    Pre-Clean-Module (PCM), Combi-Process-Module (CPM), Four-Target-Module (FTM) and Static- Deposition-Module (SDM) as well as the Rotating- Substrate-Module (RSM).

    Versatile
    Thanks to the broad spectrum of available deposition and conditioning modules the TIMARIS Cluster Tool it the ideal PVD Production Platform for a wide range of applications in the semiconductor industry.

    Future-proof
    It fulfils all connectivity standards of modern 200 mm and 300 mm foundries and is compatible with GEM300 and SECS/GEM host interfaces and allows advanced process control (APC) necessary for state-of-the art quality control.
    All modules are capable to handle 200 mm and 300 mm wafers (smaller wafers via adapters).

    Cost efficient
    SINGULUS TECHNOLOGIES offers modules with several targets and integrated heating/cooling/aligning magnetic field (AMF). This allows to very efficiently manufacture complex multi-layer-structures in just one module, saving cleanroom space as well as production time through reduction of unnecessary inter-module transfers.

    Precise
    Thanks to the patented Linear-Dynamic-Deposition-Technology (LDD) the TIMARIS cluster tool is perfect the deposition film with ultra-precise thickness control down to 0,01 nm and high uniformity. However, this technology can also be used for applications with thicknesses in the micrometer range. The high target utilization allows long lifetime before a target change.

    As of today, more than ten process modules are available to configure a TIMARIS system according to customer needs. These modules include the Multi-Target-Module, Oxidation-Process-Module, Pre-Clean-Module, Combi-Process-Module, Four-Target-Module and Static-Deposition-Module as well as the Rotating-Substrate-Module. The Rotating-Substrate-Module is extremely versatile with up to 12 cathodes, possibility to co-sputter, DC and RF.. The TIMARIS PVD modules incorporate the full scope of sputtering techniques as: DC magnetron sputtering, pulsed DC magnetron sputtering and RF magnetron sputtering as well as combinations of these modes are selectable by recipe.


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