Am Studio 2D
Berlin,  12489

  • Booth: B2376

Discover Semiconductor Excellence-Proven Metrology Solutions

Bruker delivers cutting-edge metrology solutions for the challenging demands of the semiconductor
industry. Advanced automation systems and rapid, non-contact analysis tools facilitate applied materials
research and process control in semiconductor manufacturing.

Discover a comprehensive spectrum of solutions ranging from x-ray technology, AFM, and Stylus Profiling
to Nano-Indentation, WLI, Ellipsometry, and nanoscale IR spectroscopy.
Applications include critical dimension metrology, the nanoscale characterization of electrical, mechanical,
and chemical properties, failure analysis and defect detection in wafer production, post-CMP and post-etch
processes, and C-S thin films and multi-layer thin film characterization.

Empowering semiconductor excellence with proven metrology solutions.


  • Bruker’s Dimension XR scanning probe microscope
    Bruker’s Dimension XR scanning probe microscope (SPM) - Extreme research systems for nanomechanics, nanoelectrical and nanoelectrochemistry...

  • Bruker’s Dimension XR scanning probe microscope (SPM) systems incorporate decades of research and technological innovation. With routine atomic defect resolution, and a host of unique technologies including PeakForce Tapping®, DataCube modes, SECM and AFM-nDMA, they deliver the utmost performance and capability. The Dimension XR family of SPMs package these technologies into turnkey solutions to address nanomechanical, nanoelectrical, and electrochemical applications. Quantification of materials and active nanoscale systems in air, fluid, electrical, or chemically reactive environments has never been easier.
  • Bruker's Dimension IconIR
    Bruker's Dimension IconIR - Photothermal AFM-IR for ultimate versatility in materials research and industrial R&D...

  • Bruker’s large-sample Dimension IconIR system combines nanoscale infrared (IR) spectroscopy and scanning probe microscopy (SPM) on one platform to deliver the most advanced spectroscopy, imaging, and property mapping capabilities available for academic researchers and industrial users. Incorporating decades of research and technological innovation, IconIR provides unrivaled performance based on and building off the industry-best AFM measurement capabilities of the Dimension Icon®. The system enables correlative microscopy and chemical imaging with enhanced resolution and monolayer sensitivity, while its unique large-sample architecture provides ultimate sample flexibility for the broadest range of applications. For example, the new IconIR polymer solution is an all-in-one package designed to include everything one would need to address key polymer research needs.

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