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POSAS GmbH

Paul-Meisinger-Str. 18
Deuerling,  D-93180

Germany
http://www.posas.net
  • Booth: B1221


Precursor and Dopant Gas Delivery Solutions, Monitoring

POSAS GmbH can offer all kind of Ozone Equipment like generators, analysers, calibrators, destruct units or complete Delivery Systems as well as sensor products to Enhance the Overall Equipment Efficiency (OEE) via Advanced Process Control (APC) like the Piezocon concentration sensor for precise precursor delivery, NDIR end-point-detectors for NF3, CO2... cleans, In-Situ Wafer Temperature Measurement. POSAS is also a specialist for In-Line monitoring systems of chemical composition and physical properties of wet processes based on IR or UV Technology. We represent: Applied Precision, AEROQUAL (gas detection), CI-SEMI (Chemical Monitoring, Pyrometer), Teledyne, INUSA (Ozone), LOREX (gas analysers), and we are the VEECO Channel Partner for all Veeco Flow Technology Products in Europe

NEW: we can offer Teledyne API Instruments, VEECO Precursor Delivery Systems and Gas Mixing Systems for epitaxy, ALD, MOCVD and other applications

NEW: we are a partner of TIGER OPTICS, LLC for the semiconductor industry (AMC monitoring and trace gas analysers)

  


 Products

  • Rasirc Product Line
    PeroxidizerⓇ HVM-ready stable bulk H2O2 vapor delivery systems RHSⓇ Droplet-free water vapor delivery system BRUTEⓇ Hydrazine Series BRUTEⓇ Peroxide Series...

  • PeroxidizerⓇ
    HVM-ready stable bulk H2O2 vapor delivery systems for low temperature oxide ALD/CVD and thermal oxidation applications

    • Configurable flowrate and hydrogen peroxide allows for scaling from single wafer to batch ALD1
    • Suitable for gap-fill post deposition anneal applications where uniform oxidation throughout the trench is required
    • Enables in-situ cleaning – alternative to wet cleaning
    • 1 Available flowrate: 5~20SLM of carrier gas, up to 50,000ppm of hydrogen peroxide

    RHSⓇ
    Droplet-free water vapor delivery system for next generation semiconductor device manufacturing

    • RASIRC’s membrane technology reduces droplets by diffusing water into gas stream as a vapor
    • Highly repeatable water vapor output up to 5,000mg/min
    • Better alternative to flash vaporizer and bubbler

    BRUTEⓇ Hydrazine Series
    First ever ultra high purity hydrazine source for semiconductor manufacturing

    • Reactive nitrogen source and a reducer enabling low temperature semiconductor processes
    • High reactivity allows for conformal deposition in the high aspect-ratio structures without defects
    • Effective, byproduct-free cleaner/reducer for metals; applicable for FEOL, BEOL and hybrid bonding applications
    • Addition of extremely low vapor pressure solvent enables safe handling of hydrazine

    BRUTEⓇ Peroxide Series
    Ultra high purity, high concentration hydrogen peroxide source for oxide ALD/CVD applications

    • Hydrogen peroxide source for rapid R&D and HVM
    • Highly reactive oxidant in the low temperature regime, suitable for low temperature oxide ALD/CVD processes
    • Dense hydroxyl formation allows for better nucleation of ALD/CVD films
    • Opens up new process window that were unavailable with ozone and water due to their lack of reactivity at low temperature regime

  • Apex Gas Mixing System
    The Complete Solution for Precision Point-of-Use Gas Mixing. The Apex Gas Mixing System achieves a high return of investment by reducing gas purchase costs, improving repeatability and increasing system up-time....

  • The Complete Solution for Precision Point-of-Use Gas Mixing

    The Apex Gas Mixing System, powered by Veeco’s production-proven Piezocon® Gas Concentration Sensor, allows manufacturers to reduce production costs by purchasing lower-cost, higher-concentration gases, then diluting at the point of use to immediately reduce gas purchase costs by as much as 60 percent. By using Piezocon to measure and control the mixture in real time, manufacturers eliminate the problems associated with constant flow mixers requiring wasted materials and constant scrubbing, furthering the already substantial cost savings. The stable output and precise control of gas concentration allows Apex to drive higher process tool up-time, eliminating the need to re-qualify after every gas cylinder change, reducing—and in some cases fully eliminating—system down-time due to routine cylinder changes. Apex drives real-time control, high precision and reproducibility and lowers cost of ownership for semiconductor manufacturers.

    • Immediately reduces gas purchase costs by as much as 60 percent
    • Optimized for applications requiring low-concentration, high-precision and cost-sensitive gas mixtures
    • Improves repeatability by 10x or more when compared to individual gas cylinders
    • Increases system up-time by eliminating excursions and re-qualifications, and reducing test time
    • Seamlessly integrates with existing installed base for a wide range of applications including solar, semiconductor and more
    • The only gas mixing system that uses Veeco’s Piezocon Gas Concentration Sensor for ppm-level control

    For real-time control, high precision and repeatability, and lower cost of ownership, count on the Apex Gas Mixing System from Veeco.

  • CI-SEMI WetSpec200
    CI-SEMI’s in-line, multi-channel wet process analysis system, WetSpec 200 enables non-contact real-time monitoring and closed-loop control of chemical composition in wet process applications....

  • WetSpec200: Wet Process Concentration Analyzer

    Multi Channel Concentration Analyzer

    CI-SEMI’s in-line, multi-channel wet process analysis system, WetSpec 200 enables non-contact real-time monitoring and closed-loop control of chemical composition in wet process applications.

    The WetSpec200 is ideal for monitoring, cleaning and etching chemistries. Based on CI-SEMI’s novel chemo-metric methodology, the WetSpec200 measures the absorption spectrum in the near infrared (NIR) fast and accurately without labor and waste involved.

    The system’s versatile SW models enable soft-switch between different chemistries. With the capability to monitor up to eight flow cells in parallel, the WetSpec200 provides an efficient, low cost per channel process monitoring.

    When integrated into a control system, the WetSpec200 enables tighter process control and identifies process excursions before they affect yield.

  • Posas SOD-120-2 Dissolved Ozone Destruct Unit
    Dissolved Ozone Destruct Unit SOD to Integrate / Upgrade into a Wet Bench or Spray Tool...

  • Dissolved Ozone Destruct Unit SOD to Integrate / Upgrade into a Wet Bench or Spray Tool

    Ozone is widely used in the Semiconductor Industry, so draining of water and acids containing Ozone is a common problem. As Ozone is too dangerous, Ozone has to be destroyed before it leaves the equipment into the drain system of a FAB. This UV based Ozone destruct unit can be integrated into the wet equipment. Ozone can be effectively removed down to harmless levels  below 1ppm. This means the drain will last longer, no Ozone outgasses from the solution, and therefore no Ozone is distributed on the FAB via the drain.

    sod bild2

    UV based Ozone Destruct Unit SOD-120-2-OEM - Coated on the Interior and Exterior

  • Tiger Optics Spark / Spark+
    The Spark product line offers the reliability and absolute accuracy of CRDS at an affordable price....

  • The Spark product line offers the reliability and absolute accuracy of CRDS at an affordable price. Say goodbye to cumbersome, complex, costly and labor-intensive mid-20th century technology. Gone is the need for calibration, spare parts, limited measurement ranges, and worries about drift and downtime.

    The Spark is available for detection of H2O, CH4, CO, CO2, and C2H2 in many different matrices, including nitrogen, oxygen, hydrogen, and most noble gases, as well as some specialty gases, such as CO2.

    Spark H2O

    Trace moisture detection as low as 3 ppb


    Spark CH4

    Trace-level methane detection


    Spark H2O in CO2

    Trace moisture detection in pure CO2


    Spark CO / Spark+ CO

    Trace-level carbon monoxide detection


    Spark C2H2

    Trace-level acetylene detection

  • Teledyne Model 480 - Industrial Ozone Monitors
    The Model 480 is the new family of industrial ozone monitors for modern, accurate and precise ozone measurement....

  • The Model 480 is the new family of industrial ozone monitors for modern, accurate and precise ozone measurement.

    ​​​​​​Reliability and performance you can trust.​

    ​• Measures Ozone via UV-absorption method

    • State-of-the-art, mercury-free UV LED source for lower power consumption, environmental benefits, and longer life

    • Intuitive user interface and menu structures

    • High contrast graphical display (indoor/outdoor viewable)

    • Speed controlled pump for extended pump life

    • Enhanced communications, including Ethernet and WiFi capability

    • Built-in diagnostics/error logs/warning alarms

    • Latches for easy user access

    • Modular interior design for easier serviceability and quick swap capab​ilities

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