The Complete Solution for Precision Point-of-Use Gas Mixing

The Apex Gas Mixing System, powered by Veeco’s production-proven Piezocon® Gas Concentration Sensor, allows manufacturers to reduce production costs by purchasing lower-cost, higher-concentration gases, then diluting at the point of use to immediately reduce gas purchase costs by as much as 60 percent. By using Piezocon to measure and control the mixture in real time, manufacturers eliminate the problems associated with constant flow mixers requiring wasted materials and constant scrubbing, furthering the already substantial cost savings. The stable output and precise control of gas concentration allows Apex to drive higher process tool up-time, eliminating the need to re-qualify after every gas cylinder change, reducing—and in some cases fully eliminating—system down-time due to routine cylinder changes. Apex drives real-time control, high precision and reproducibility and lowers cost of ownership for semiconductor manufacturers.

• Immediately reduces gas purchase costs by as much as 60 percent
• Optimized for applications requiring low-concentration, high-precision and cost-sensitive gas mixtures
• Improves repeatability by 10x or more when compared to individual gas cylinders
• Increases system up-time by eliminating excursions and re-qualifications, and reducing test time
• Seamlessly integrates with existing installed base for a wide range of applications including solar, semiconductor and more
• The only gas mixing system that uses Veeco’s Piezocon Gas Concentration Sensor for ppm-level control

For real-time control, high precision and repeatability, and lower cost of ownership, count on the Apex Gas Mixing System from Veeco.

WetSpec200: Wet Process Concentration Analyzer

Multi Channel Concentration Analyzer

CI-SEMI’s in-line, multi-channel wet process analysis system, WetSpec 200 enables non-contact real-time monitoring and closed-loop control of chemical composition in wet process applications.

The WetSpec200 is ideal for monitoring, cleaning and etching chemistries. Based on CI-SEMI’s novel chemo-metric methodology, the WetSpec200 measures the absorption spectrum in the near infrared (NIR) fast and accurately without labor and waste involved.

The system’s versatile SW models enable soft-switch between different chemistries. With the capability to monitor up to eight flow cells in parallel, the WetSpec200 provides an efficient, low cost per channel process monitoring.

When integrated into a control system, the WetSpec200 enables tighter process control and identifies process excursions before they affect yield.

Dissolved Ozone Destruct Unit SOD to Integrate / Upgrade into a Wet Bench or Spray Tool

Ozone is widely used in the Semiconductor Industry, so draining of water and acids containing Ozone is a common problem. As Ozone is too dangerous, Ozone has to be destroyed before it leaves the equipment into the drain system of a FAB. This UV based Ozone destruct unit can be integrated into the wet equipment. Ozone can be effectively removed down to harmless levels  below 1ppm. This means the drain will last longer, no Ozone outgasses from the solution, and therefore no Ozone is distributed on the FAB via the drain.

UV based Ozone Destruct Unit SOD-120-2-OEM - Coated on the Interior and Exterior

The Model 480 is the new family of industrial ozone monitors for modern, accurate and precise ozone measurement.

​​​​​​Reliability and performance you can trust.​

​• Measures Ozone via UV-absorption method

• State-of-the-art, mercury-free UV LED source for lower power consumption, environmental benefits, and longer life

• Intuitive user interface and menu structures

• High contrast graphical display (indoor/outdoor viewable)

• Speed controlled pump for extended pump life

• Enhanced communications, including Ethernet and WiFi capability

• Built-in diagnostics/error logs/warning alarms

• Latches for easy user access

• Modular interior design for easier serviceability and quick swap capab​ilities

The Spark product line offers the reliability and absolute accuracy of CRDS at an affordable price. Say goodbye to cumbersome, complex, costly and labor-intensive mid-20th century technology. Gone is the need for calibration, spare parts, limited measurement ranges, and worries about drift and downtime.

The Spark is available for detection of H2O, CH4, CO, CO2, and C2H2 in many different matrices, including nitrogen, oxygen, hydrogen, and most noble gases, as well as some specialty gases, such as CO2.

Spark H2O

Trace moisture detection as low as 3 ppb

Spark CH4

Trace-level methane detection

Spark H2O in CO2

Trace moisture detection in pure CO2

Spark CO / Spark+ CO

Trace-level carbon monoxide detection

Spark C2H2

Trace-level acetylene detection

The Piezocon® Gas Concentration Sensor has become the industry standard among semiconductor manufacturers for accurate monitoring and reproducible delivery control of chemical precursor vapors and dopant gases in CVD and MOCVD process tools.

Production-proven with over 5,000 installations worldwide, the Piezocon system provides:

• Improved process reproducibility and increased yield by tightly controlling the delivery of process gases and of precursor chemical vapors
• Lower cost-of-operation by allowing more effective use of precursor chemicals, extending the use of precursor chemical sources and reducing the duration of flow to vent
• Easier tool-to-tool matching with quantitative information directly meaningful to equipment and process engineers
• Assistance in troubleshooting malfunction of gas and vapor delivery systems by using built-in diagnostic utilities

The Piezocon system is widely used by silicon, LED and compound semiconductor wafer and device manufacturers due to its unique ability to provide highly accurate and reproducible gas & vapor delivery monitoring. It also ensures improved process control, and can be used with a broad range of gas:gas or vapor:gas mixtures for many diverse applications.

Lowers Cost-of-Operation

The Piezocon system lowers the tool’s cost-of-operation by extending the use of precursor cylinder, bubbler or sublimater sources. Fewer vessel changes mean higher ROI and more capacity without adding more processing tools.

Easier Tool-to-Tool Matching

Tool-to-tool matching is facilitated by the Piezocon system’s ability to provide relevant quantitative information on the ratio of precursor vapor to carrier gas concentration; and precursor delivery rate (g/min or mole/min) to the process chamber.

Comprehensive Diagnostic Capabilities

The Piezocon system generates log data files with information such as vapor carrier gas concentration, precursor delivery rate, and MFC set-point, allowing optimization of the delivery system and identification of any malfunction, such as issues with the bubbler temperature or pressure, MFCs, pressure controllers, etc.