Park Systems Europe GmbH

Schildkroetstrasse 15
Mannheim,  68199

Germany
https://parksystems.com/
  • Booth: C1725

Park Systems is a world-leading manufacturer of nanometrology tools for surface analysis at nanoscale, ranging from atomic force microscopy to imaging ellipsometry.

The industrial automated AFM product line from Park Systems offers the leading nano metrology solutions for 3D surface characterization, failure analysis and large sample research. In utilizing the True Non-Contact Mode™, Park AFMs enable non-destructive measurement of soft photoresist surfaces with high aspect ratio tips. Proven SmartScanTM operation software and Single Click-AFM automation eliminates any need for sample adjustment and makes the scanning process as efficient and user-friendly as possible. AFM tools from Park Systems are trusted to deliver ultra-high resolution, unparalleled reproducibility, and extremely precise measurements quickly and easily.

Contact:

Park Systems Europe GmbH

Schildkroetstrasse 15, 68199 Mannheim, Germany

+49 621 490-896-50 [email protected]

www.parksystems.com


 Press Releases

  • Park Systems, a leading manufacturer of nano-metrology systems, announces the release of its latest atomic force microscopy (AFM) innovation, Park FX200, designed for 200 mm samples. The FX200 is developed to meet the needs of both research and industrial applications, offering significant advancements in large-sample AFM technology.

    The FX200 features an advanced mechanical structure that ensures a significantly lower noise floor and minimal thermal drift, providing increased stability during measurements. This enhancement promotes greater accuracy and reliable performance over extended operation periods.

    With faster Z servo performance, the FX200 enables rapid and precise scanning across large sample areas. Its enhanced high-power sample view with autofocus allows researchers to achieve exceptional clarity and detail in AFM imaging, regardless of sample type or condition.

    The FX200 includes several automated features to streamline operations and maximize efficiency. Automatic probe recognition and exchange eliminate manual adjustments, while a reduced laser spot size and automatic alignments improve measurement accuracy and consistency.

    Macro optics provides a full 200 mm sample view, allowing comprehensive analysis without the need for stitching multiple images. This capability is enhanced by automatic sequential measurements at predefined coordinates, facilitating efficient data collection across large sample areas.

    Park FX200 is designed with user convenience in mind, featuring automatic AFM scan parameter settings. This intuitive interface allows researchers to focus on their scientific objectives rather than instrument configuration, enhancing productivity and workflow efficiency.

    Furthermore, its superior performance capabilities make it ideal for a wide range of research and industrial applications, including investigating surface morphology, characterizing mechanical properties, and exploring nanoscale phenomena, delivering reliable results for contemporary scientific endeavors. Representing a significant advancement in AFM technology, Park FX200 offers enhanced precision, automated efficiency, and comprehensive sample visualization. 

    About Park Systems Corp. (KOSDAQ: 140860)

    Park Systems is a world-leading manufacturer of atomic force microscopy (AFM), ellipsometry and other nano-metrology systems with a complete range of products for researchers and engineers in the chemistry, materials, physics, life sciences, semiconductor, and data storage industries. Its mission is to enable nanoscale advances for scientists and engineers solving the world's most pressing problems and pushing the boundaries of scientific discoveries and engineering innovations. Customers of Park Systems include most of the world's leading semiconductor companies and national research universities in Asia, Europe and the Americas. Park Systems is a publicly traded corporation on the Korea Stock Exchange (KOSDAQ) with corporate headquarters in Suwon, Korea, and regional headquarters in Santa Clara, Mannheim, Paris, Nottingham, Beijing, Tokyo, Singapore and Bengaluru. To learn more, please visit http://www.parksystems.com.

    Contact:

    [email protected]


 Products

  • Park NX-Wafer
    NX-Wafer is the only wafer fab AFM with automatic defect review. It provides a fully automated AFM solution for defect imaging and analysis that improves defect review productivity by up to 1,000%....

  • Unique features:

    • Low noise Atomic Force Profiler for accurate, high throughput CMP profile measurements
    • Sub-Angstrom surface roughness measured with extreme accuracy and minimized tip-to-tip variation

    Smart ADR Software

    Park's Smart ADR NX-Wafer provides fully automated defect review and identification, enabling a critical inline process to classify defect types and source their origin through high resolution 3D imaging.
    Designed specifically for the semiconductor industry, Smart ADR is the most advanced defect review solution available, featuring automatic target positioning without the need for labor intensive reference marks that often damage the sample. The Smart ADR process improves productivity by up to 1,000% compared to traditional defect review methods. Additionally, the new ADR capability offers up to 20x longer tip life thanks to Park's groundbreaking True Non-Contact™ Mode AFM technology.

    Read more: https://www.parksystems.com/en/products/in-line-metrology-afm/wafer-fabrications/nx-wafer 

  • Park FX200
    Park FX200, Park Systems' latest innovation in Atomic Force Microscopy tailored for 200 mm samples....

  • Unique features:

    • Enhanced AFM Core Technology
    • Handles Wafers and Multiple Samples
    • Intelligent Automation
    • Simplified Operation
    • Next Generation AFM Controller for High-End Products

    Boasting an advanced mechanical structure that ensures a significantly lower noise floor, minimal thermal drift, and exceptional stability, the FX200 sets a new standard in precision and reliability. Its faster Z servo performance and improved high-power sample view enhance operational efficiency and imaging capabilities, while features like automatic probe recognition and probe exchange, laser beam alignment, and macro optics for full sample view simplify user experience and maximize productivity. With optical autofocus, navigation, and sequential measurements at multiple coordinates, coupled with automated AFM scan parameter settings, automated data analysis, the FX200 streamlines complex operations, making it the ideal choice for both research and industrial applications. Delivering superior performance and ease of use, Park FX200 stands poised to revolutionize nanoscale imaging and analysis, empowering scientists and engineers to achieve unprecedented insights and advancements in their fields.

    Read more: https://www.parksystems.com/en/products/research-afm/large-sample-afm/fx200

  • Park NX-Mask
    Innovative new generation of photomask repair equipment that incorporates advanced atomic force microscopy technology. It provides an all-in-one solution, accelerating the throughput with unprecedented repair efficacy....

  • Key Features

    • No risk of damage and seamless repair of any type of defects
    • Compatible with a dual pod for handling EUV masks
    • All-in-one solution for locating defects and post-repair verification

    Revolutionizing photomask repair, the Park NX-Mask system addresses the challenges of shrinking device sizes and increasing photomask complexity with its advanced AFM technology. It precisely removes defects without the damage risks associated with E-beam or laser systems, maintaining the integrity of the reflective surface and patterns. With a unique depth control of ±7.5 µm, NX-Mask efficiently handles various defect types and integrates smoothly into in-line processes for quick repairs.

    Read more: https://www.parksystems.com/en/products/in-line-metrology-afm/photomask-repair/nx-mask

  • Park NX-3DM
    Park Systems has introduced the revolutionary Park 3DM Series, a completely automated AFM system designed for overhang profiles, high-resolution sidewall imaging, and critical angle measurements....

  • A fully automated industrial AFM using NX technology

    • NX technology automatically constructs an extremely accurate topographical image and collects essential dimensional data
    • The low-noise Z-detector works on an independent, closed loop to minimize errors in topography
    • True Non-ContactTM mode allows for the collection of high-resolution and accurate data without tip-sample damage

    Innovative head design for undercut and overhang structures

    • Patented decoupled XY and Z scanning systems work together with the tilted Z-scanner, letting users overcome normal challenges in accurate sidewall analysis associated with normal and flare tip methods
    • Z-head tilting mechanism allows access to the sidewalls using an ultra-sharp tip to obtain the same high resolution and definition as is obtained over the rest of the material

    A Reliable, Seamless Measurement Tool for 3D materials

    • No sample preparation is required to obtain the sidewall roughness or critical dimension measurements in this process
    • By utilizing Z-head tilting and True Non-ContactTM mode, the NX-3DM allows for both tip-preserving and high-resolution collection of sidewall data

    Read more: https://www.parksystems.com/en/products/in-line-metrology-afm/wafer-fabrications/nx-3dm

  • Park NX-TSH
    The automated Atomic Force Microscopy (AFM) system for ultra large and heavy flat panel displays at nanoscale...

  • As the demand for Atomic Force Metrology for larger flat panel displays increases, Park NX-Tip Scan Head overcomes nanometrology challenges for samples over 300mm. The Tip Scanning Head (TSH) and gantry style air-bearing stage allows Park NX-TSH to accurately image roughness measurement, step height measurement, and critical dimension measurement.

    The fully Automated Tip Scanning Head for OLED, LCD, and 2D encoder sample

    • Tip Scanning Head in X, Y and Z directions, up to 100 µm x 100 μm (x-y direction) and 15 μm Z-direction
    • Flexible chuck to accommodate large and heavy samples over 300mm and 1KG
    • Long Range Air-bearing XY stage for AFM analysis of industrial samples larger than 300 mm
    • 100 µm x 100 µm Flexure-Guided XY Scanner with Closed-loop Dual Servo System
    • 15 µm High Speed Z Scanner with Low Noise Position Sensor
    • Automatic Measurement Control and automated system features such as live monitoring of the measurement process, automatic analysis of acquired measurement data, and more!

    Read more: https://www.parksystems.com/en/products/in-line-metrology-afm/flat-panel-display/nx-tsh

  • Accurion EP4
    Our latest imaging ellipsometer, combines ellipsometry and microscopy for precise characterization of thickness and refractive index on micro-structures as small as 1 µm....

  • Key Features

    • Modular setup: Easy upgrades between different configurations from BAM, single wave-, multiwave- to full spectroscopic ellipsometer

    • Spectroscopic imaging ellipsometry from 190/250/360 nm to 1000/1700/2700 nm

    • Highest lateral ellipsometric resolution of 1 µm, allowing to determine thickness and refractive index on microstructures as small as 1 µm

    • Ellipsometric enhanced contrast images for a live visualization of the sample

    • First identify, then measure: Intuitive selection of measurement region by drawing region in live view

    • Parallel measurement of multiple regions within the selected field of view

    • Knife-edge illumination for the non-destructive suppression of disturbing backside-reflections

    • Enlarge your measurement possibilities by using additional accessories, e.g. cells, temperature control or liquid handling

    • Quality Control: Also available as OEM version for QC in product lines

    Read more: https://www.parksystems.com/en/products/ellipsometers/imaging-spectroscopic-ellipsometry-/ep4


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