(1) Hydrostatic Bearing System
Non-contact operation provides extremely high rigidity and stability, effectively preventing vibration-induced surface defects. Ideal for processing brittle materials.
(2) Low-Stress Processing Technology
Reduces micro-cracks and internal stress generated during wafer processing, improving yield and reliability.
(3) Smart Monitoring and AI Diagnostic Functions
Real-time feedback system monitors spindle condition, load pressure, and grinding wheel rack status to prevent wafer cracks and detect abnormal wafer quality conditions, improving equipment uptime.
(4) Customization Capability
Chuck sizes can be customized according to customer requirements, supporting thinning processes for semiconductor materials of various sizes.
(5) Multi-worktable Design
The multi-worktable design allows users to process wafers of different materials and thicknesses, as well as perform rough and fine grinding simultaneously. This enhances application flexibility.