The Vistec SB254 electron beam lithography system has been designed as a universal and cost-effective tool for both direct write and mask making applications to allow the customers to react quickly to market demands.
With its 210 x 210mm stage travel range it is the ideal tool for exposing masks up to 7inch and wafers up to 200mm diameter. The concept of the SB254 enables handling and exposure of transparent and non-transparent compound semiconductor materials. The modular system architecture allows your SB254 to be adapted to meet your application requirements. The small cleanroom footprint and the fully automated substrate handling as well as the state of the art operating and data preparation software will convince you of the excellence of the SB254 Series being part of the modular toolset Vistec is offering to its customers from the industry and applied research sector.