Taiyo Nippon Saoso(TNSC) was the first company to introduce its self-developed commercial MOCVD systems in 1983. TNSC equipment for mass-production and R&D has received praise for its world-class performance and stability.
The SR4000 series, originally introduced in 2002, is highly regarded worldwide for its exceptionally stable performance for HEMT, PN Diode, Laser, and UVLED applications. The newly introduced SR4000HT-RR has a compact design especially suited for university and research environments while maintaining high performance capability. Recently we developed the new function as “LV option” which is usable for several low vapor pressure materials and this option could be combine for SR series.
The UR series, available since 2008, includes workhorse solutions for production applications. Regarding the newly introduced UR26K-CCD, two important mechanisms added to the equipment, “Cassette-to-Cassette Wafer Handling System” and “Integrated Dry- Cleaning System”, have led to increased productivity.
Since 2022, TNSC launched FR2000-OX reactor. This reactor equipped some unique technologies about Face-Down, Triple gas injection and Hot Wall, its for Ga2O3 material and makes very uniform layer.