Wonik IPS: Your Trusted Partner in Advanced Semiconductor & Display Manufacturing Solutions
Since our establishment in 1996, Wonik IPS has been at the forefront of semiconductor innovation. Our journey began with the successful development of PE-SiON and PE-TEOS CVD equipment in 2000, leading to mass production partnerships with industry giants like Samsung Electronics (since 2004) and SK Hynix (since 2006).
Today, our global footprint extends to major players worldwide, including GlobalFoundries in the United States and CXMT in China. Our flagship ARC and TEOS PECVD systems command a dominant 50% market share in South Korea, a testament to their enduring performance and reliability.
Our Leading-Edge Product Portfolio :
CVD / ALD Solutions
* GEMINI™: SiON, a-Si, TEOS, PEOX, and ALDOX for DRAM, NAND, and Logic
* QUANTA™: HT-TEOS, HT-SiN, and HT-PEOX for NAND
* NOA™: W, Ti, and TiN metal deposition for DRAM and NAND.
* HyEta™: SiO2 Gap Fill and High-K Metal Gate (HKMG) applications in DRAM and NAND.
Diffusion & Thermal Processing Solutions
* 300series: Oxidation, Anneal, Alloy, PI Bake, Poly, ALDOX, and SiN for DRAM and NAND.
* LEVATA™: Poly Si Epi growth for DRAM and NAND