Bronkhorst High-Tech BV

<p></p><p></p><p><span lang="en-us" xml:lang="en-us">Bronkhorst offers one of the industry's broadest portfolios of gas mass flow meters and controllers for semiconductor equipment, process development and high-purity gas handling. Flow ranges start as low as <strong>0.7 sccm</strong> and extend up to <strong>11,000 m³n/h</strong>, covering everything from ultra-low precursor dosing to large-scale gas distribution systems. Advanced thermal and Coriolis technologies provide high accuracy, excellent repeatability and fast response. Features include multi-gas/multi-range capability, integrated diagnostics, pressure compensation, fieldbus connectivity and compact designs for OEM integration. Metal-sealed models with high-purity wetted surfaces and helium leak-tight construction are available for demanding semiconductor applications including deposition, etching, ALD, CVD and gas cabinet systems.</span></p><p></p>... More Info Less Info

<p><span lang="en-us" xml:lang="en-us">Bronkhorst liquid flow instrumentation supports precise dosing and flow control of chemicals, solvents, additives and precursors used throughout semiconductor manufacturing and R&D. Thermal liquid flow instruments cover ranges from <strong>5 mg/h to 1 kg/h</strong>, while Coriolis-based systems measure and control mass flow rates from <strong>50 mg/h up to 600 kg/h</strong>. Ultrasonic technology provides additional solutions for low-viscosity liquids and unknown fluids. Available features include direct mass flow measurement, density and temperature output, multi-parameter monitoring, high dosing accuracy and digital communications. Compact designs, excellent repeatability and independence from changing fluid properties make these instruments ideal for chemical delivery systems, coating processes, CMP applications and precursor supply skids.</span></p><p></p>... More Info Less Info

<p><span lang="en-us" xml:lang="en-us">Bronkhorst pressure meters and controllers provide accurate pressure measurement and control for semiconductor processes where stability and repeatability are critical. Pressure ranges start at <strong>100 mbar</strong> and extend up to <strong>400 bar</strong>, with specialist high-purity versions available for clean gas applications. The instruments feature fast PID control, excellent stability and extensive digital communication options for seamless equipment integration. Combined flow and pressure control solutions simplify system architecture and improve process consistency. Applications include gas delivery systems, vacuum processes, reactor pressure control, test equipment and analytical instrumentation. Available configurations include forward and back-pressure control, multi-channel systems and metal-sealed designs for high-purity environments.</span></p><p></p>... More Info Less Info

<p><span lang="en-us" xml:lang="en-us">Bronkhorst Vapor Delivery Systems provide accurate generation and control of vaporized liquid precursors for advanced semiconductor processes. Based on patented Controlled Evaporation & Mixing (CEM) technology, these systems combine liquid dosing, carrier gas control and evaporation in one integrated solution. Liquid flows from <strong>1 to 1200 g/h</strong> can be converted into stable vapor flows from <strong>50 mln/min up to 100 ln/min</strong>, depending on configuration. The technology offers excellent repeatability, rapid response and precise control of vapor concentration, while handling pure liquids, mixtures and dissolved materials. Typical semiconductor applications include ALD, CVD, MOCVD, PECVD and process humidification. Compact pre-engineered modules reduce integration effort and accelerate time-to-market for equipment manufacturers.</span></p><p></p>... More Info Less Info