SVG TECH GROUP

Technical features

• The large-format iGrapher is a large direct writing lithography system specially designed for rapid and high-quality patterning on large-size substrates (with a meter-scale area). The iGrapher 1000-3000 series covers lithography areas ranging from 32 inches to 130 inches, meeting the large-area patterning needs for touch control, display, lighting, and more.
• The iGrapher series is equipped with a 355 nm solid-state laser as the light source and a writing optical system with high numerical aperture to support the processes for near ultraviolet photosensitive materials. It has an air-bearing motion system, an interferometer closed-loop system, and an environmental control system, provides excellent capabilities to control the linewidth precision and uniformity, and supports 24/7 continuous operation.
• It supports common industrial data formats such as GDSII and DXF to meet conventional lithography requirements. It is equipped with a data processing server to support high-resolution, real-time, and high-throughput processing of 3D structure data formats such as STL, as well as real-time pattern transforming of the analytically expressed designs. It is an effective equipment for innovation and development of micro/nano optical materials and optical films.

Technical features

Technical features

• The MiScan direct writing lithography system has efficient writing performance and is a multi-purpose patterning lithography system designed for the development and small-volume production and application of devices. It is equipped with a high-power fiber laser or an ultraviolet 355 nm pulse laser, and allows for high-quality fabrication of high-resolution micro-/nanostructures when using with an amplitude-phase joint modulation pattern generator and a high-precision motion control system.
• The writing area of the standard model is up to 8-10 inches, which caters to applications such as optical devices, advanced packaging, and conventional masks. We provide customized equipment with a writing area from 400 mm to 600 mm for the fabrication of large-area micro/nano patterns, such as micro-nano optical materials, panel-level format packaging research, etc.
• It supports common 2D and 3D industrial data formats such as GDSII and STL to meet the needs of conventional multi-purpose lithography, and provides optional data processing servers to meet the needs of large-volume data writing and customized data processing. It can be customized with partition alignment and multi-chip array functions for small batch customized production.

Technical features

• Nanocrystal is a maskless lithography system specially designed for the fabrication of nano optical structures. It is equipped with a phase interference system with continuously variable spatial frequency to enable the fabrication of sub-wavelength optical structures with sub-nanometer modulation precision.
• The lithography system adopts a 355 nm ultraviolet light source, an interferometric optical system with a large numerical aperture (NA=0.9), and a field of view (FOV) with a pixel size of 100 micron for the fabrication of micro/nano optical structures in the 150 nm - 5 μm range. It is equipped with 3D navigation focusing and high speed in-flight exposure mode, and is a good method for fabricating large-area sub-wavelength structures.It can be applied to the research of photonic crystals, diffractive optical elements, light field modulation displays, and optical metasurfaces, and fabrication of relevant devices.