LINTEC Co., Ltd.

MC-7000 Series

Achieves high-speed flow control of 200msec (typical) by using a thermal sensor. By using the Lintec’s unique non-contact, thermal flow rate sensor and piezo control valve, it’s possible to control the flow of corrosive gases with ultra-high speed.
This product offers ±1.0% S.P. high accuracy flow rate control, and has DeviceNet or EtherCAT digital communication interface available for selection.

Feature

• Ultra high-speed flow control 200msec
• Accuracy ±1%S.P.
• Operating temperature 5 to 50°C
• Metal seal
• Clean (zero particle structure)
• Ambient temperature sensor
• EtherCAT communication
• DeviceNet™ communication

Example of Use
High-speed etching process

In semiconductor manufacturing process, there is a need to improve the throughput in parallel with miniaturization. Even for mass flow controllers that control the flow rate of reactant gases, there is an increasing demand for shorter flow rate control start (rise) times. The ultra high-speed mass flow controller [MC-7000] is a non-contact thermal flow sensor that does not contact the flow sensor and the flow measuring gas and achieving an ultra-high-speed response of 200 msec. Since it is a non-contact type, high-speed flow rate control is possible for measuring the flow rate of corrosive gases.

 

Example of Use

Communication Unification of EtherCAT Communication Devices

EtherCAT communication (digital interface) is increasingly used in semiconductor manufacturing equipment for high-speed control of robot arms and other transport systems. 65,536 nodes are available for EtherCAT communication, enabling unification of all measurement and motion elements of the MFC with EtherCAT communication.

Specification Table

MC-700 Series

Variable range function allows flow control at different setups with a single unit, which eliminates the necessity to use multiple MFCs and thus helps to reduce the spare parts’ number. This MFC is ideal for experimental tools which often require gas type and flow rate change.

MC-10 Series

A low-cost mass flow controller ideal for controlling the flow rate of inert gases such as Ar, N2, etc. and controlling the flow rate of Air. Limited specifications enable quick delivery time.

RS-485 digital interface and variable range function are available as options

Example of Use

PVD

In PVD film deposition processes such as sputtering, Ar is generally used as an inert gas, a stable gas that is less likely to cause chemical reactions. If you need to control the flow rate of an  inert gas such as Ar, we recommend the low-cost mass flow controller MC-10RC.

Inert gas analysis and experimental equipment

We recommend the low-cost MC-10RC for applications that don’t require corrosive gases. Furthermore, with the VR function option, it is possible to change the gas type and flow range in-line. This product is ideal for simple experiments and analytical equipment.

Specification Table

MM-3000L-TN Series

High temperature is possible by separating the wetted part and the circuit board part which is sensitive to heat.

Specification Table