Resist for photomask・・・A material necessary for the manufacture of photomasks, on which minute electronic circuits are drawn for use in the photolithography process to form the circuits of semiconductor devices. We sell electron beam resists for manufacturing those masks.
Photo resist・・・Photosensitive polymer materials are essential for the process of creating circuit patterns. As the exposure wavelength becomes shorter with the process shrink, improvements are being made in ArF, KrF, and more recently, EUV resists that use extreme ultraviolet wavelengths. We offer a broad lineup of resists ranging from g-line to EUV resists.
Developer・・・A material for photoresit development.
CMP slurry・・・Abrasives that make surfaces with a mixture of interconnect metals of varying hardness, insulating films, and thin metal films uniform and smooth on a nano-unit basis.
Thin films・・・Insulating material with low dielectric constant. Used to prevent, for example, a reduction in the operating speed of semiconductors caused by the narrowing of the insulating area between wires.
Cleaner Etchant・・・Various cleaning solutions to remove dust and other contaminants after etching.
Polyimide・・・A insulating materials for packaging. A compound that boasts high heat resistance and insulating properties and is used as a protective film for semiconductors. It is also used as a rewiring layer material for IC chips.
Process chemicals・・・These chemicals are used to remove foreign matter in the cleaning and drying processes of semiconductor manufacturing, and to remove metals, oils, and greases in the etching process, and are key products in the semiconductor manufacturing process.
WCM・・・Our Wave Control Mosaic and Color MosaicTM are colored photosensitive material products for the production of micro color filters in image sensors. Those are pigmented, negative tone, photosensitive materials used to pattern color filter arrays for Image Sensor (IS) and other sensing applications.