STI CO., LTD.

Types of parts include rings, wall liners, wide pockets, boats, plates, baffles, tubes, and domes.

It is useful for semiconductor etching processes that have excellent abrasion resistance and light transmittance and are integrated below 17nm due to the lack of micro bubble.

As the excellence of synthetic quartz is known, the semiconductor industry is replacing much of the existing natural quartz with synthetic quartz.

Silicon carbide single crystal (PVT) growth furnace of STi Co., Ltd. is growth equipment by using PVT (Physical Vapor Transport) method, which is a vapor phase transfer growth method and uses an induction heating method in the intermediate frequency range. This equipment is a SiC single crystal growth equipment that can grow 6-8 inch(150-200mm) ingot (STi has now completed development of 8-inch grower equipment and is ready to supply it to customers' needs at any time).

The standard configuration of the equipment consists of a reaction chamber/induction heating control device/gas supply control panel/vacuum exhaust line/cooling water supply and recovery/temperature and system automatic control/alarm and HMI system.