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EV Group

DI Erich Thallner Straße 1‎
St. Florian am Inn,  4782

Austria
http://www.EVGroup.com
  • Booth: 1520


Visit EVG at booth # 1520!

EV Group (EVG) provides innovative process solutions and expertise that serve leading-edge and future semiconductor designs and chip integration schemes.
EVG’s high-volume-manufacturing-ready products, which include wafer bonding, lithography, thin-wafer processing and metrology equipment, enable advances in semiconductor front-end scaling, 3D integration and advanced packaging, as well as in other electronics and photonics applications. 
With state-of-the-art application labs and cleanrooms at its headquarters in Austria, as well as in North America and Asia, EVG is focused on delivering superior process expertise to its global R&D and production customer and partner base – from the initial development through to the final integration at the customer’s site.
Founded in 1980, EVG services and supports an elaborate network of global customers and partners all over the world, with more than 1600 employees worldwide and fully-owned subsidiaries in the U.S., Japan, South Korea, China, Taiwan and Singapore.


 Products

  • EVG®6200 NT
    Mask Alignment System (semi-automated / automated)...

  • The EVG®6200 NT mask aligner is a versatile tool for optical double-side lithography and wafer sizes up to 200 mm.

    Known for its automation flexibility and reliability, the EVG6200 NT provides state-of-the-art mask alignment technology on a minimized footprint area combined with the utmost throughput, advanced alignment features and optimized total cost of ownership. Operator-friendly software, minimized time for mask and tooling changes, as well as efficient worldwide service and support makes it the ideal solution for any manufacturing environment. The EVG6200 NT or the fully-housed EVG6200 NT Gen2 mask alignment systems are available in semi-automated or automated configuration and equipped with integrated vibration isolation to achieve excellent exposure results for a wide range of applications, such as exposure of thin and thick resists, patterning of deep cavities and comparable topographies, as well as processing of thin and fragile materials such as compound semiconductors. Furthermore, the EVG’s proprietary SmartNIL technology is supported on both semi-automated and fully automated system configurations.

    Features

    • - Wafer/substrate size from pieces up to 200 mm/8’’
    • - System design supporting versatility of lithography processes
    • - Throughput up to 180 WPH in first print mode or up to 140 WPH in automatic alignment mode
    • - Fragile, thin or warped wafer handling of multiple wafer sizes with quick change-over time
    • - Automated contact-free wedge compensation sequence with proximity spacers
    • - Auto origin function for precise centering of alignment key
    • - Dynamic alignment function featuring real-time offset correction
    • - Supports the latest UV-LED technology
    • - Rework sorting wafer management and flexible cassette system
    • - Manual substrate loading capability on automated system
    • - Field upgradeable from semi-automated to fully automated version
    • - Minimized system footprint and facility requirements
    • - Multi-user concept (unlimited number of user accounts and recipes, assignable access rights, different user interface languages)
    • - Advanced Software features and compatibility between R&D and full-scale production
    • - Agile processing and conversion re-tooling
    • - Remote tech support & SECS/GEM compatibility
    • - Table top or stand-alone version with anti-vibration granite table
    • - Additional capabilities:
      • Bond alignment
      • IR alignment
      • Nanoimprint lithography (NIL)
      • SmartNIL®
  • GEMINI® FB XT
    Automated Production Wafer Bonding System...

  • Integrated platform for high precision alignment and fusion bonding

    Vertical stacking of semiconductor devices has become an increasingly viable approach to enabling continuous improvements in device density and performance. Wafer-to-wafer bonding is an essential process step to enable 3D stacked devices. EVG's GEMINI FB XT integrated fusion bonding system extends current standards and combines higher productivity with improved alignment and overlay accuracy for applications such as memory stacking, 3D systems on chip (SoC), backside illuminated CMOS image sensor stacking, and die partitioning. The system features the SmartView bond aligner, developed specifically for fusion and hybrid wafer bonding alignment requirements.

    Features

    • - New SmartView® NT3 face-to-face bond aligner with sub 50 nm wafer-to-wafer alignment accuracy
    • - Up to six pre-processing modules like:
      • Clean module
      • LowTemp™ plasma activation module
      • Alignment verification module
      • Debond module
    • - XT Frame concept for highest throughput with EFEM (Equipment Frontend Module)
    • - Optional features:
      • Debond module
      • Thermocompression bond module
  • EVG®850 TB
    Automated Temporary Bonding System...

  • Fully automated temporary wafer bonding of a substrate on a rigid carrier

    The fully automated temporary bonding system achieves the whole temporary bonding process – starting with temporary adhesive application, baking, alignment and bonding of the device wafer to the carrier wafer – within one automated tool. The equipment layout is modular as with all EVG’s fully automated tools, meaning it can be throughput-optimized depending on the specific process.

    Because of EVG’s open platform, different types of temporary bonding adhesives can be used, such as spin coat thermoplast, thermoset materials, or tapes.

    Features

    • - Open adhesive platform
    • - Various carriers (silicon, glass, sapphire, etc…)
    • - Bridge tool capability for different substrate sizes
    • - Available with multiple load port options and combinations
    • - Recipe controlled system
    • - Real time monitoring and recording of all relevant process parameters
    • - Fully integrated SECS/GEM interface
    • - Optional integrated inline metrology module for automated feedback loop
  • EVG®850 DB
    Automated Debonding System...

  • Fully automated debonding, cleaning and unloading of thin wafers

    The EVG®850 DB is a fully automated debonder for the separation and cleaning of processed temporary bonding wafer stacks. The fragile device wafers are always supported either through film frame mounting or through a thin wafer handler.

    Features

    • - Reliable handling of thinned, bowed and warped wafers with and without topography
    • - Automated cleaning of debonded wafer
    • - Recipe controlled system
    • - Real time monitoring and recording of all relevant process parameters
    • - Fully integrated SECS/GEM interface in automated tools
    • - Bridge tool capability for different substrate sizes
    • - Modular tool layout → throughput-optimized depending on specific process
  • EVG®610
    Mask Alignment System...

  • The EVG®610 is a compact and multi-purpose R&D system that can handle small substrate pieces and wafers up to 200 mm.

    The EVG610 supports a variety of standard lithography processes, such as vacuum-, hard-, soft-, and proximity exposure modes, with the option of back-side alignment. Moreover the system offers additional capabilities including bond alignment and nanoimprint lithography (NIL). The EVG610 offers quick processing and re-tooling for changing user requirements with a conversion time of less than a few minutes. Its advanced multi-user concept can be adapted from beginners to expert level, thus making it ideal for universities and R&D applications. 

    Features

    • - Wafer/substrate size from pieces up to 200 mm/8’’
    • - Top-side and bottom-side alignment capability
    • - High-precision alignment stage
    • - Automated wedge compensation sequence
    • - Motorized and recipe-controlled exposure gap
    • - Supports the latest UV-LED technology
    • - Minimized system footprint and facility requirements
    • - Step-by-step process guidance
    • - Remote tech support
    • - Multi-user concept (unlimited number of user accounts and recipes, assignable access rights, different user interface languages)
    • - Agile processing and conversion re-tooling
    • - Table top or stand-alone version with anti-vibration granite table
    • - Additional capabilities:
      • - Bond alignment
      • - IR alignment
      • - Nanoimprint lithography (NIL)

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