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Raana Semiconductors Pvt Ltd

FORT.Hosur SIPCOT Industrial Innovation Centre, SIPCOT Phase-II, Moranapalli ,Hosur. Tamilnadu – 635 109, India.
Krishnagiri,  Tamil Nadu  635109

India
https://raana.in/
  • Booth: 1281


Join Raana Semiconductors at SEMICON 2025– Hall 1,Booth 1281

Raana Semiconductors Pvt Ltd (RSPL) is a leading technology company specializing in advanced crystal growth systems, laser crystals, and semiconductor solutions. With a vision to drive innovation and support India's self-reliance, RSPL delivers indigenous, cost-effective, and high-quality products for mission-critical applications in Atomic, defense, solar, and semiconductor industries.

Key Achievements:

             Award-winning R&D, including ELCINA and IDEX recognitions. Expertise in Nd:YAG, Piezoelectric, and Sapphire crystals. Trusted supplier to National laboratories like BARC, IGCAR, RRCAT, CMET, DRDO and others.

Specializations:

            Proprietary crystal growth technology with automation for precision. Products like laser rods and semiconductor crystals. Focus on defense applications, photonic integrated circuits, and sustainability.

Project Relevance:

            Our cutting-edge capabilities in crystal growth and R&D directly align with the project goals, ensuring innovation, precision, and national strategic value. Raana Semiconductors is dedicated to advancing India’s position in global technology through excellence and collaboration.


 Press Releases

  • RSPL is a leading and trusted brand in the semiconductor industry with a proven track record of over a decade. We have emerged as one of the most trusted brands in India for providing high-quality products and services to our valued customers, owing to our extensive experience.

    At RSPL, we take pride in our strong reputation for providing cutting-edge solutions that cater to the diverse requirements of the semiconductor market. Our dedication to excellence and customer satisfaction has allowed us to establish long-term relationships with reputable industries, prestigious research laboratories, and prestigious universities.

    One of the key factors that distinguishes RSPL is our expertise in developing innovative solutions to meet the industry's ever-changing demands. We understand that the semiconductor landscape is dynamic, and we continuously invest in research and development to stay ahead of the curve. In order to deliver solutions that go above and beyond expectations, our team of qualified professionals is skilled at utilizing the newest technologies and business best practices.

    We firmly believe thatquality is essential and the foundation of our operations. Every product that bears the RSPL name undergoes rigorous quality control procedures to ensure its reliability, durability, and performance. Our dedication to maintaining the highest standards has earned us the trust of our clients, reinforcing our position as a market leader.

    With a customer-centric approach, we strive to provide unparalleled service to our clients. Our team of experts is readily available to address any queries, offer technical guidance, and provide personalized support at every stage of the customer journey. We believe in forging lasting partnerships by delivering value and fostering mutual growth.


 Products

  • Silicon Ingot Manufacturing System
    Our Silicon Ingot Manufacturing System uses the Czochralski (CZ) process to produce high-purity monocrystalline silicon ingots for semiconductor and solar use, offering precise control, automation, and thermal stability for consistent quality....

    • Crystal Growth (CZ Method):
      Uniform diameter control with high-precision pulling and seed rotation.

    • Hot Zone & Furnace:
      Graphite heater, quartz crucible, and 4000 Gauss magnetic field for clean melting.

    • Thermal Uniformity:
      Unique HOT zone design ensures stable temperature gradients.

    • Automation & Monitoring:
      SCADA/HMI interface, real-time control, and data logging.

    • Process Control:
      Bi-directional rotation (0.1–30 RPM) and programmable lift rates (0.02–60 mm/min).

    • Chamber Specs:
      Furnace Ø1200 mm, height 2000 mm; Receiving chamber Ø410 mm, height 4500 mm.

    • Charging Capacity:
      28 kg to 350 kg silicon loading.


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