GenISys GmbH

<p><strong>BEAMER</strong> is the premier layout data preparation software for electron-beam, laser, and optical lithography. It bridges CAD layout design and exposure tool execution, providing advanced pattern processing and Proximity Effect Correction (PEC) to maximize write speed, precision, and yield.</p><p>Key features include:</p><p><strong>Advanced Fracturing & Data Prep:</strong> Supports all major exposure tool formats and layout standards (GDSII, OASIS, CIF, DXF) with high-speed fracturing for complex curved geometries and photonic structures.</p><p><strong>Proximity Effect Correction (PEC):</strong> Features industry-leading 3D PEC, shape-dependent dose assignment, and process blur compensation for high-resolution nanolithography.</p><p><strong>VisualFLOW™ Interface:</strong> Modular, drag-and-drop flow design that automates complex multi-step data preparation pipelines and enhances reproducibility.</p><p><strong>Layout Editing & Verification:</strong> Includes an integrated</p>... More Info Less Info

<p><strong>LAB</strong> is a comprehensive layout and process optimization platform for computational lithography and simulation. Designed to accelerate development and reduce production costs, LAB enables fast virtual exploration of large parameter spaces for projection, proximity, laser, and electron-beam lithography.</p><p>Key features include:</p><p><strong>Multi-Technology Support:</strong> Models projection, proximity, laser, and e-beam exposure tools within a single simulation platform.</p><p><strong>Advanced Simulation:</strong> Fast and accurate calculation of intensity images, aerial/bulk images, and 3D resist development modeling (including Mack4 and CAR models).</p><p><strong>Optimization & Verification:</strong> Supports Rule-based and Model-based Optical Proximity Correction (OPC), process window analysis (DOF, FEM, MEEF), and layout verification.</p><p><strong>VisualFLOW™ Interface:</strong> Intuitive drag-and-drop workflow creation with powerful 1D, 2D, and 3D visualization and automated metrology capabilities.</p>... More Info Less Info

<p><strong>TRACER</strong> is an advanced Monte Carlo simulation software designed to quantify electron-solid interactions and perform precise process calibration for electron-beam lithography. It enables users to accurately model electron scattering, analyze energy distribution, and generate essential Point Spread Functions (PSFs) required for effective Proximity Effect Correction (PEC).</p><p>Key features include:</p><p><strong>Monte Carlo Simulation:</strong> Rapidly computes electron scattering across arbitrary material stacks, accounting for primary and secondary electron spread and trajectory visualization.</p><p><strong>PSF Management & Analysis:</strong> Extracts 1D/2D PSFs, supports multi-Gaussian model fitting, averaging, and convolution, and seamlessly integrates with BEAMER for streamlined PEC workflows.</p><p><strong>Advanced Process Calibration:</strong> Determines critical parameters such as base dose, process blur, process bias, and lateral development using measured critical dimension (CD) data.</p><p><strong>Extensive Material Library:</strong> Includes a comprehensive built-in database of common semiconductors, metals, insulators, and resists, with easy creation of custom materials.</p>... More Info Less Info

<p><strong>ProSEM</strong> is an advanced SEM metrology and automation package designed for fast, accurate measurement and analysis of micro- and nanostructures, process calibration, and lithographic patterns.</p><p>While modern lithography tools are highly automated, SEM-based metrology and inspection often remain manual and time-consuming. ProSEM provides an easy, automated, and reliable measurement solution for R&D institutions, multi-user facilities, and specialized manufacturing environments.</p><p>Key capabilities include:</p><p><strong>Automated SEM Metrology:</strong> Automated image analysis, line-width/CD measurement, line-edge roughness (LER), and contact hole analysis.</p><p><strong>Process Calibration & Optimization:</strong> Integrates seamlessly with simulation and PEC workflows to extract real-world process bias and parameters.</p><p><strong>High Efficiency & Reproducibility:</strong> Eliminates manual, operator-dependent measurement errors and streamlines data collection for fast batch processing.</p>... More Info Less Info

<p><strong>InSPEC</strong> is an integrated SEM metrology and inspection software suite and upgrade kit that transforms standard scanning electron microscopes into advanced, automated inspection and metrology tools. It provides comprehensive solutions for multi-chip, large-area monitoring and high-throughput data processing.</p><p>Key capabilities include:</p><p><strong>SEM Upgrade Solution:</strong> Integrates via dedicated hardware and digital/analog interfaces to enable automated scanning, direct tool control, and precise beam positioning.</p><p><strong>Advanced Multi-Chip Inspection:</strong> Supports multi-chip, large-area monitoring with integrated contour detection, automatic drift correction, and layout-based measurement jobs.</p><p><strong>Streamlined Workflow:</strong> Features 5 dedicated operational modes (Global, Local, SEM Live, Run, and Results) for setup, execution, and fast data review.</p><p><strong>Enhanced Productivity & Quality:</strong> Significantly improves SEM utilization, data consistency, and process control while preserving full system versatility.</p>... More Info Less Info