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BHORUKA SPECIALTY GASES PRIVATE LIMITED

PART 1, Plot No. 5A & 6, Whitefield Main Rd, Doddanakundi In
Garudachar Palya, Mahadevapura,
Bangalore,  Karnataka  560048

India
https://bhorukaspecialtygases.com
  • Booth: H7207

Bhoruka Specialty Gases Pvt. Ltd. ,(BSG) a flagship company of the SOL Group, is one of India's leading manufacturers of Specialty Gases, Ultra High Purity (UHP) Gases, Calibration Gas Standards, and engineered gas handling solutions. With over five decades of manufacturing excellence, we serve high-technology industries including semiconductors, electronics, photovoltaics, pharmaceuticals, aerospace, healthcare, research laboratories, and advanced manufacturing. We manufacture and supply a comprehensive range of Ultra High Purity gases including Nitrogen, Argon, Helium, Hydrogen, Oxygen, Carbon Dioxide, Methane, and custom gas mixtures. Our specialty gas portfolio also includes precision calibration gas standards, hydrocarbon mixtures, sulfur mixtures, VOC standards, BTEX mixtures, natural gas standards, and application-specific gas mixtures. Our products support critical semiconductor applications such as wafer fabrication, process monitoring, analytical instrumentation, leak detection, inert atmosphere processing, research & development, quality assurance, and advanced packaging. Our advanced manufacturing facilities, precision gas blending systems, and analytical laboratories ensure consistent product quality, traceability, and dependable performance. Every product undergoes rigorous quality verification and is supplied with comprehensive documentation to meet customer specifications. Driven by innovation, technical expertise, and a commitment to quality, BSG partners with customers to deliver reliable gas solutions that enhance manufacturing efficiency, product quality, and process performance. As India's semiconductor ecosystem continues to expand, we remain committed to supporting the industry's growth through dependable supply, customized solutions, and responsive technical support.

 Products

  • Ultra High Purity Gases (Nitrogen, Hydrogen,Argon, Helium)
    <p><span>BSG supplies <strong>Ultra High Purity Bulk Gases</strong>, including <strong>Hydrogen (Hâ‚‚), Nitrogen (Nâ‚‚), Argon (Ar), and Helium (He)</strong>, for semiconductor fabs, electronics manufacturing, solar industries, and research facilities. Available in Semiconductor Grade up to <strong>6N purity</strong>, our bulk gases are used for <strong>wafer processing, sputtering, plasma etching, annealing, chamber purging, leak detection, cryogenic cooling, carrier gas applications, and cleanroom operations</strong>. Supported by reliable supply systems and technical expertise, we provide dependable gas solutions for mission-critical manufacturing processes.</span></p><p></p>...

  • Phosphine (PH3) and Diborane (B2H6)
    <p><span>BSG supplies <strong>Ultra High Purity Phosphine (PH₃)</strong> and <strong>Diborane (B₂H₆) </strong>mixture in <strong>Semiconductor Grade</strong> with purity up to <strong>6N (99.9999%)</strong>, manufactured to meet the stringent quality requirements of advanced semiconductor fabrication. These specialty doping gases are supplied with tightly controlled impurity specifications to ensure consistent process performance and high device reliability.</span></p><p><span>Phosphine is widely used as an <strong>N-type dopant</strong>, while Diborane serves as a <strong>P-type dopant</strong> in silicon wafer fabrication. Both gases play a critical role in <strong>ion implantation, epitaxial growth, CMOS and memory device manufacturing, compound semiconductors, and high-efficiency solar cell production</strong>, enabling precise electrical characteristics in advanced semiconductor devices.</span></p>...

  • TEOS (Tetra Ethyl Ortho Silicate)
    <p><span>BSG supplies <strong>Semiconductor Grade Tetraethyl Orthosilicate (TEOS)</strong> with ultra-low metal impurities for advanced CVD applications. Our TEOS is specially processed to meet the stringent quality requirements of semiconductor manufacturing. It is widely used as a <strong>silicon dioxide precursor</strong> for interlayer dielectric deposition, shallow trench isolation (STI), semiconductor packaging, MEMS fabrication, optical coatings, and high-performance electronic devices.</span></p>...

  • Ammonia (NH3) and Methane (CH4)
    <p><span>BSG supplies <strong>High Purity Electronic Grade Ammonia (NH₃)</strong> and <strong>Methane (CH₄)</strong> for semiconductor and electronics manufacturing. Available up to <strong>6N purity</strong>, these gases are produced to meet strict semiconductor quality standards. Ammonia is widely used for <strong>silicon nitride deposition, nitridation, and CVD/ALD processes</strong>, while methane is used in <strong>carbon-based thin-film deposition, plasma processing, diamond film growth, graphene research, and advanced semiconductor applications</strong>.</span></p><div contenteditable="false"><hr /></div><h2></h2>...

  • SiH4
    <p><span>BSG Supplies <strong>Electronic Grade Silane (SiHâ‚„)</strong> with purity up to <strong>7N (99.99999%)</strong> for advanced semiconductor and electronics applications. Our silane meets the demanding purity requirements of modern wafer fabrication and thin-film deposition processes. It is widely used in <strong>PECVD, LPCVD, amorphous silicon deposition, silicon nitride and silicon oxide film formation</strong>, TFT-LCD displays, OLED manufacturing, MEMS devices, and thin-film solar cells.</span></p>...

  • Etching and Cleaning Gases (BCl3, NF3, SF6)
    <p><span>BSG supplies <strong>Ultra High Purity Boron Trichloride (BCl₃), Nitrogen Trifluoride (NF₃), and Sulfur Hexafluoride (SF₆)</strong> in <strong>Semiconductor Grade</strong> with purity up to <strong>6N (99.9999%)</strong>, manufactured to meet the stringent quality requirements of advanced semiconductor fabrication. These specialty process gases are produced with tightly controlled impurity specifications to ensure high process stability, superior etch performance, and reliable chamber cleaning in critical manufacturing environments.</span></p><p><span>BCl₃ is widely used for <strong>dry plasma etching of aluminum, polysilicon, and metal layers</strong>, while NF₃ serves as a highly efficient <strong>in-situ chamber cleaning gas</strong> for CVD, PECVD, and ALD equipment. SF₆ is extensively used for <strong>plasma etching of silicon, silicon dioxide, silicon nitride, and MEMS structures</strong>. Together, these gases play a vital role in <strong>semiconductor wafer fabrication, integrated circuit manufacturing, display production, power electronics, MEMS devices, and advanced electronic materials processing</strong>.</span></p>...

Categories

303 Gases
  • Analytical Instrumentation Mixtures
  • Dopant Gases
  • Environmental Compliance Mixtures
  • Etchant Gases
  • Laser Gas Mixtures
  • Other Specialty; Mixed Gas
  • Pure & Bulk Gases
  • Rare; Noble Gases
  • Reactant Gases
  • Silicon Precursor Gas

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