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SCREEN SPE Singapore Pte. Ltd.

29 Kaki Bukit View
Kaki Bukit Techpark II
Singapore,  415963

Singapore
https://www.screen-spe.com/sg/
  • Booth: 334

The use of semiconductors has spread by leaps and bounds into personal computers, smartphones, automobiles, and more. And expectations for that evolution is increasing, such as in the expanding markets for various sensing device and MEMS, and as a major participant in the advancement of power devices and LEDs that support environment-conscious products, and in IoT (Internet of Things), which will surely play an important role in the worldwide social infrastructure.

On a base of our core technologies in etching and photolithography that we have cultivated over the years, SCREEN entered into the semiconductor production equipment market in the 1970s. With our cleaning equipment business, we have built a steadfast share in the increasingly important cleaning process. In order to even further strengthen our business, we have added lithography equipment -- represented by the SOKUDO DUO coater/developer that is equipped with various defect control functions based on fundamental but novel, industry-first, concepts -- millisecond annealers that are indispensable in processing advanced devices, as well as nano-level laser annealers and other units to our product lineup. 

 Press Releases

  • SCREEN’s exhibits feature a diverse lineup of proprietary semiconductor manufacturing equipment, including its number one global share* wafer cleaning systems, annealing measurement, and inspection systems. Content related to SCREEN’s global service initiatives, including post-sales support, as well as technology development, will also be displayed.
    *According to Company Research

 Products

  • Single Wafer Cleaner “SU-3200”
    <p><span style="font-family:Arial, sans-serif;">The de facto standard in single wafer cleaners, expandable up to 12 chambers</span></p><p></p><p><span style="font-family:Arial, sans-serif;">FEATURES</span></p><p></p><ul><li>Handles a wide range of chemical solutions for enhanced processing flexibility</li><li>Versatile chemical supply system</li><li>Designed for exceptionally easy maintenance</li></ul>...

  • Spin Scrubber “SS-3200”
    <p><span style="font-family:Arial, sans-serif;">High throughput has made it the de facto standard in spin scrubbers</span></p><p></p><p><span style="font-family:Arial, sans-serif;">FEATURES</span></p><p></p><ul><li>An advanced transport system and proprietary algorithm deliver approximately twice the throughput* of the previous model</li><li><span></span><span style="font-family:Arial, sans-serif;">Offers the same chamber configuration, cleaning items, and other processing functions as the SS-3100 </span><i><span style="font-family:Arial, sans-serif;">(*Compared to SS-3100</span>)</i><p></p></li></ul>...

  • Wet Station “FC-3100”
    <p><span style="font-family:Arial, sans-serif;">The de facto standard batch-type cleaner that boasts high productivity, stability and reliability</span></p><p></p><p><span style="font-family:Arial, sans-serif;">FEATURES</span></p><p></p><ul><li>7 <span></span><span style="font-family:Arial, sans-serif;">independent modules enhance system configuration flexibility</span></li><li><span></span><span style="font-family:Arial, sans-serif;">High throughput of up to 1,000 wph</span><p></p></li><li><span></span><span style="font-family:Arial, sans-serif;">The HiLPD (low-pressure drying) greatly reduces watermarks and high-concentration IPA vapor prevents pattern collapse</span><p></p><p></p></li></ul>...

  • Wet Station “FC-821L”
    <p><span style="font-family:Arial, sans-serif;">Compact half-pitch and one-bath batch cleaning system</span></p><p></p><p><span style="font-family:Arial, sans-serif;">FEATURES</span></p><p></p><ul><li><span></span><span style="font-family:Arial, sans-serif;">Enables half-pitch transfer of wafers. The size of baths has been reduced to minimize the volume of chemicals and DI water used</span></li><li><span></span><span style="font-family:Arial, sans-serif;">The CHB chemical circulation bath allows for the use of high-temperature and high-concentration chemicals</span></li><li><span></span><span style="font-family:Arial, sans-serif;">A low-pressure dryer prevents watermarks and pattern collapse</span><p></p><p></p><p></p></li></ul>...

  • Spin Scrubber “SS-80EX”
    <p><span style="font-family:Arial, sans-serif;">Spin scrubber combining high productivity and functionality</span></p><p></p><p><span style="font-family:Arial, sans-serif;">FEATURES</span></p><p></p><ul><li><span style="font-family:Arial, sans-serif;font-size:10.5pt;">Equipped with 5 varieties of cleaning tools to meet a wide range of needs</span></li><li><span></span><span style="font-family:Arial, sans-serif;">Precision bevel cleaning contributes to yield increase</span></li><li><span></span><span style="font-family:Arial, sans-serif;">Maintenance can be performed during operation, reducing downtime</span><p></p><p></p></li></ul>...

  • Coat/Develop Track “RF-200EX”
    <p><span style="font-family:Arial, sans-serif;">Introducing a coat/develop track system for power and automotive devices</span></p><p></p><p><span style="font-family:Arial, sans-serif;">FEATURES</span></p><p></p><ul><li><span></span><span style="font-family:Arial, sans-serif;">Designed for expandability and flexibility to support both legacy and DUV processes</span></li><li><span></span><span style="font-family:Arial, sans-serif;">Proven 300mm unit technologies have been redeployed to this new 150–200mm dedicated platform, ensuring a smaller footprint and enhanced productivity</span><p></p><p></p></li></ul>...

Categories

203 Inspection & Measurement Products
  • Defect; Particle; Bump; Contamination Detection, Review or Inspection
  • Film Thickness; Thickness; Uniformity Measurement; Ellipsometer
  • Line Width; Critical Dimension (CD) Measurement
  • Overlay Measurement
    • 205 Nanotechnology Equipment and Tools
  • Equipment, Nanotechnology Tools
    • 207 Process Equipment
  • Cleaning; Washing; Drying Equipment for Substrate, Fab Processing
  • Coat; Develop; Resist Processing; Track Equipment
  • Etching; Stripping; Ashing - Dry and Wet Equipment
  • Spin on Glass (SOG); on Dielectric (SOD) Track systems

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