SCIL Nanoimprint Solutions
Nanoimprint Lithography Solutions
SCIL Nanoimprint Solutions offers solutions for patterning nano-structures on large wafers by using its unique and proprietary lithography technology (SCIL).
SCIL or Substrate Conformal Imprint Lithography is a cost effective, robust, high yield process enabling nanometer resolution patterns on a large variety of materials. SCIL delivers proven, high quality imprints on wafer areas up to 200 mm. It can be used to make patterns with feature sizes down to less than 10 nm and overlay alignment of 1 µm. Overlay alignment down to 100nm is on the development roadmap.
SCIL Nanoimprint Solutions helps customers with optimized equipment, consumable materials and processes for high volume production. Our solutions enable semicon manufacturers to increase performance, lower end-product costs and increase functionality.
初出展/New Exhibitor Yes
新製品/New Products Yes
製品展示/Displaying Equipment No
デモンストレーション/ Product Demonstrations No
産業・技術分野/ Industries/Technologies LED/solid state lighting, MEMS, その他/Other, 太陽光発電(PV)/Photovoltaic, プラスチック/有機/プリンテッドエレクトロニクス/Plastic/organic/flexible electronics, パワー半導体/Power Semiconductors, 半導体/Semiconductor