Develop the Next Breakthrough
Used world-wide, MSP's Turbo-Vaporizer transitions liquids into gases so they can be used for gas phase processes. This vapor deposition tool is ideal for any application which requires a high quality, stable vapor. They are used primarily in thin film deposition by:
Additionally, our vapor deposition tool provides very uniform thin films for diamond-like coatings (DLC) and SiC-based applications.
This direct liquid injection vaporizer (DLI Vaporizer) uses a droplet atomization technique. The Turbo-Vaporizer™ design applies advanced aerosol science and thermo-dynamics to create a more precise solution for liquid source vaporization.
While other vaporizers have difficulty vaporizing thermally sensitive liquids or liquids with low vapor pressure, MSP's Turbo-Vaporizer successfully vaporizes them with a very stable concentration output and easily adjustable liquid flow rates. It also features a wider process window, producing lower and higher vapor concentrations than other vaporizers.
Our Performance Enhanced (PE) Turbo-Vaporizers provide even higher performance and increased precision to vaporize your liquid precursors. It:
- Reduces atomized droplet size
- Increases thermal efficiency
- Reduces response time
- Eliminates liquid bubble formation
- Increases process options
- Lowers maintenance costs
- Reduces downtime
MSP’s vapor delivery systems more completely vaporize your liquid precursors, leading to more uniform thin film depositions, denser films, and films with more resistance to plasma-induced damage. Our systems are able to vaporize liquid precursors that are too difficult to vaporize by other methods (such as thermally sensitive materials, and materials with low vapor pressure) - including CCTBA, TEMAZr and TEMAHf molecules.