Beneq

ESPOO, 
Finland
https://beneq.com/en/
  • 小間番号5034


Beneq is the home of ALD. Welcome to our virtual booth!

Beneq is the home of atomic layer deposition. In 1984, we established the world’s first industrial production using ALD. Today, we lead the market with products for R&D (TFS 200, TFS 500, R2), semiconductor device fabrication (TransformTM), 3D and batch production (P400A, P800, P1500), ultra-fast spatial ALD (C2R), and roll-to-roll ALD (Genesis). 

Beneq’s unique Development Service simplifies customer adoption and proof-of-concept for new ALD processes, while our Coating Service cuts down time to market by outsourcing state of the art ALD production. Our team of engineers and experts is dedicated to making ALD tools accessible for researchers. 

 プレスリリース

  • BENEQ, PRESS RELEASE, December 6, 2021 

    Beneq, a forerunner in industrial production using atomic layer deposition (ALD), has launched two new products for semiconductor device fabrication: the Transform® 300 and ProdigyTM. 

    Dedicated to the success of More-than-Moore device makers, Beneq revolutionized ALD cluster tools when it launched the highly successful Beneq Transform® family of products. Today, Beneq broadens its product portfolio further with two new and distinct solutions.  

    The Beneq Transform 300 and Prodigy were each designed in response to growing technology requirements in the semiconductor manufacturing sector. 

    “The Transform 300 is designed to meet the growing demand of emerging semiconductor applications at 300 mm for devices such as CMOS image sensors, Power Devices, Micro-OLED/LED, and Advanced Packaging, which call for a high degree of versatility,” explains Patrick Rabinzohn, Vice President, Semiconductor ALD at Beneq.  

    “We created Prodigy to address those market segments that need a simple solution supported by high-end technology. It inherits the ALD design and processing knowhow we at Beneq have developed over the last 15 years, packing advanced features in a simpler, targeted industrial form factor,” continues Rabinzohn. 

     

    Beneq Transform® 300 

     

     

    Beneq Transform 300 is the only 300 mm ALD cluster tool that combines thermal ALD (batch) and plasma ALD (single wafer) technologies to provide a highly versatile platform for IDMs and foundries. It is dedicated to advanced thin-film applications in CIS, Power, Micro-OLED/LED, Advanced Packaging and other MtM applications.  

    Beneq Tranform 300 is a highly configurable platform that caters to multiple advanced thin-film applications ranging from gate dielectric including in high aspect ratio trenches, to anti-reflection coating, final passivation or encapsulation, Chip-Scale-Packaging and beyond.   

     

    Beneq ProdigyTM 

     

    Beneq Prodigy is the deal manufacturing solution for compound semiconductor including RF IC’s (GaAs/GaN/InP), LED, VCSEL, Light Detectors and for MEMS manufacturers and foundries looking to enhance device performance and reliability through an affordable stand-alone ALD batch tool. Beneq Prodigy provides best-of-breed passivation and encapsulation films across multiple wafer types and sizes. 

    To learn more, visit: 

    Beneq Transform 300:  https://beneq.com/en/products/semiconductors/transform300/ 

    Beneq Prodigy: https://beneq.com/en/products/semiconductors/prodigy/ 

     
    Further information:  
    Lie Luo, Head of Marketing, lie.luo@beneq.com  

     
    About Beneq   

    Beneq is the home of atomic layer deposition. In 1984, we established the world’s first industrial production using ALD. Today, we lead the market with products for R&D (TFS 200, TFS 500, R2), semiconductor device fabrication (Transform®), 3D and batch production (P400A, P800, P1500), ultra-fast spatial ALD (C2R), and roll-to-roll ALD (Genesis).   

    Beneq’s unique Development Service simplifies customer adoption and proof-of-concept for new ALD processes, while our Coating Service cuts down time to market by outsourcing state of the art ALD production. Our team of engineers and experts is dedicated to making ALD tools accessible for researchers.   

      

 出展製品

  • Beneq Transform
    Beneq Transform is a versatile, automated ALD solution for high-throughput production. The SEMI-certified Transform configures with multiple process modules combining thermal and plasma ALD for easy fab integration....

    • Beneq Transform™ establishes a completely new class of ALD cluster tool products in it’s versatility and adaptability to address a broad range of applications and market segments. Beneq Transform™ configures with multiple ALD process modules to meet a specific wafer capacity requirement or be later upgraded in response to growing volumes or with new ALD applications.

    The Beneq Transform™ offers both single wafer or batch processing with the capabilitiy to deposit the widest range of high-performance oxides and nitrides. With its flexible automation platform and unique capability to combine both thermal batch and plasma enhanced ALD process modules in one integrated system, Beneq Transform™ offers unparalleled flexibility in how processing sequences can be realized to meet the most demanding thin-film deposition requirements.

    The Beneq Transform™ is fully compliant with SEMI S2/S8 and SECS/GEM standards and easily fab integratable with industry-standard horizontal wafer loading. It is designed to meet the needs of GaN & SiC power devices, RF devices, photonics, and encapsulation.

  • Beneq P800
    Beneq P800 is one of the largest batch ALD systems on the market and specifically designed to coat large complex parts or big batches of small parts. The Beneq P800 is perfect for optical coating and anti-corrosion coatings on semiconductor equipment....

    • As one of the largest batch ALD systems on the market, Beneq P800 is specifically designed to coat big parts of complex shapes or large batches of smaller parts. The Beneq P800 is commonly used for batch of parts with diameter larger than 600mm. The large batch capability can also reduce the cost for smaller parts making ALD commercially feasible across many application areas. Our customers use the P800 for optical coatings, anticorrosive coatings of semiconductor equipment parts, and various applications where ALD is used on glass or metal sheets.

    We select and design the optimal tool setup and ALD process based on each customer’s substrate and application. The P800’s design allows you to customize your chamber configuration giving the ability to smoothly transition from R&D to volume production using the same ALD system. Beneq provides tailored application development as well as pilot production support, so you can test things out before setting up your own ALD manufacturing capacity.

    The P800 is uniquely engineered for the production of thick films stacks by ALD. We have designed the P800 with high-capacity precursor sources and precursor deactivation and filtration systems to address associated challenges of batches of thick films, like high precursor volume and residues. Use the P800 for some of the widest flexibility in coating thickness available.

  • Beneq Transform Lite
    Like Transform, but Light! Beneq Transform Lite offers the same thermal, plasma and preheating options as the Transform, but gives you the flexibility to scale from R&D to prototyping to full volume production of up to 8 in wafers for MtM applications....

    • Maximize versatility as volume scales. The BENEQ Transform™ Lite offers the same thermal, plasma and preheating module as the larger Transform™. It works well for R&D, prototyping, as well as volume production. It is capable of surface pre-treatment and can coat substrate materials at wafer sizes from 3 to 8 inches. With the BENEQ Transform™ Lite customers can now run several different ALD processes on multiple devices and applications, all on a single footprint!

  • Beneq Transform 300
    Beneq Transform® 300 combines thermal and plasma ALD in an integrated 300 mm cluster tool for MtM applications including CIS, Power, Micro-OLED/LED, and Advanced Packaging....

    • Beneq Transform® 300 is the only 300 mm ALD cluster tool combining thermal ALD (batch) and plasma ALD (single wafer) technologies to provide a highly versatile platform to IDMs and foundries. Transform® 300 is dedicated to a broad range of advanced thin-film applications from gate dielectric, including in high aspect ratio trenches, to anti-reflection coating, final passivation or encapsulation and beyond for high-volume manufacturing CIS, Power, Micro-OLED/LED, Advanced Packaging and other MtM devices.
  • Beneq Prodigy
    Beneq Prodigy™ is the simple and elegant ALD solution for high-volume manufacturing of compound semiconductors and MEMS....

    • Beneq Prodigy™ sets a new standard for affordable volume manufacturing of compound semiconductors (CS) and MEMS devices with ALD. It is the ideal manufacturing solution for compound semiconductor including RF IC’s (GaAs/GaN/InP), LED, VCSEL and Light Detectors and for MEMS providing best-of-breed passivation and encapsulation films across various wafer sizes and types. Enjoy a simple, yet elegant, solution for enhancing device performance on 75-200 mm wafers with a low-cost batch tool with latest ALD technology.

Categories

205 装置、ナノテクノロジー
  • 装置/ナノテクノロジー機器
    • 207 装置、プロセス
  • コート/現像/レジストプロセス/搬送装置
  • 積層化：化学的気相成長（ＣＶＤ）/MOCVD/ PECVD/ LPCVD/ ALD/ REALD/ MVD
    • 300 材料、組み立て
  • 薄膜；絶縁フィルム材
    • 305 材料、ナノテクノロジー
  • 材料；ナノテクノロジー
    • 700 製造サービス
  • 廃棄サービス
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