Gudeng Precision Industrial

The dual-layer design of the box provides high-efficiency protection for the transportation and storage of 6-inch EUV reticles between process stations.

The inner EIP can be operated in a vacuum environment.

Supports purge function to control the temperature and humidity of the micro-environment inside the reticle carrier box.

Size: 6 x 6 x 0.25 (in.)

Material: PEEK (ESD), Metal

Usage: Support purge function

Provides high-efficiency protection for the transportation and storage of 6-inch reticles between process stations.

The integrated upper cover design is easy to clean, and the use of wear-resistant and high-clean materials reduces the risk of particle generation.

The large transparent window is easy to view the internal reticle information.

Size: 6 x 6 x 0.25 (in.)

Material: Low moisture absorption & Super clean material

Application: Support 200mm SMIF standard mechanical interface

Provides high-efficiency protection for 6-inch reticles during transportation and storage between process stations.

Supports OHT automatic transportation and has an purge function to control the temperature and humidity of the micro-environment inside the reticle box.

The interior is covered with a special material to block the electric field and protect the reticle from electrostatic damage.

Size: 6 x 6 x 0.25 (in.)

Material: PEEK(ESD)

Usage: Single reticle transport or storage

Application: Support SMIF standard mechanical interface and suitable for ASML exposure machine or Support purge function

Provides 300mm wafer frame with high-efficiency protection during transportation and storage.

Low-outgassing material can effectively reduce the risk of wafers being contaminated due to outgassing.

Size: 300mm (12 in.)

Material: PC (ESD)

Piece: 13 piece