SCIL Nanoimprint Solutions

Eindhoven, 
Netherlands
http://www.scil-nano.com
  • 小間番号3622


Nanoimprint Lithography Solutions

SCIL Nanoimprint Solutions offers solutions for patterning nano-structures on large wafers by using its unique and proprietary lithography technology (SCIL).

SCIL or Substrate Conformal Imprint Lithography is a cost effective, robust, high yield process enabling nanometer resolution patterns on a large variety of materials. SCIL delivers proven, high quality imprints on wafer areas up to 200 mm. It can be used to make patterns with feature sizes down to less than 10 nm and overlay alignment of 1 µm. Overlay alignment down to 100nm is on the development roadmap.

SCIL Nanoimprint Solutions helps customers with optimized equipment, consumable materials and processes for high volume production. Our solutions enable semicon manufacturers to increase performance, lower end-product costs and increase functionality.


 出展製品

  • LabSCIL
    A semi-automatic nano-imprint tool for creating high-quality nano- and micro-structures using the unique SCIL imprint technology....

  • Key features

    • Tri-layer stamp construction allows conformal contact printing even on non-flat surfaces.
    • Unique SCIL imprint process ensures sub 10 nm resolution with low pattern deformation and no stamp damage by particles
    • Fully automated overlay alignment (same surface and front-to-backside) with better than +/- 1 µm in X,Y
    • The excellent etch properties of the sol-gel resist result in high selectivity and etch rates
    • The thermal stability, optical transparency and (UV) stability of the sol-gel makes it suitable as functional layer in devices

    Description

    • Tool use designed for SCIL soft-composite-stamp conformal imprinting
    • Wafer feed unit.
      • A coated wafer is placed in a holder which ensures centering and aligning towards a notch or flat
      • The wafer is automatically moved into the imprint unit in a reproducible position relative to the stamp (maintaining centering and alignment)
    • The overlay alignment, imprint, (UV) curing and stamp release sequence runs fully automatic
    • Control software:
      • Fully automatic and semi-automatic mode
      • Individual flow for each substrate for process development or evaluation
      • Library function for recipes and flows
      • All process parameters shown on the touchscreen
      • Real time wafer counter on the touchscreen
      • User management
      • Logging of all relevant process parameters linked to wafer ID
    • Error tracking history Remote connection possible for maintenance and error, sensor logging

  • AutoSCIL
    A fully automatic nano-imprint tool for creating high-quality nano- and micro-structures using the unique SCIL imprint technology....

  • Key features

    • Integration of all essential process steps in one closed coupled system
    • Compact tool with minimal floor space in cleanroom and gray area
    • Tri-layer stamp construction allows conformal contact printing even on non-flat surfaces
    • Unique SCIL imprint process ensures sub 10 nm resolution with low pattern deformation and no stamp damage by particles
    • Fully automated overlay alignment (same surface and front-to-backside) with better than +/- 1 µm in X,Y
    • The excellent etch properties of the sol-gel resist result in high selectivity and etch rates
    • The thermal stability, optical transparency and (UV) stability of the sol-gel makes it suitable as functional layer in devices
    • Use of NanoGlass sol-gel based imprint material increases stamp lifetime.
    • Integrated UV curing for UV activated NIL resists
    • Imprint system open to all PDMS compatible imprint materials
    • Overall combining highest imprint quality and yield with low total cost of ownership

    Description

    • Integrated processes:
      • Robot handling
      • Rotational wafer alignment towards notch or flat
      • Wafer centering
      • Spin-coating
      • Inktjet printing (option)
      • SCIL soft-composite-stamp conformal nano-imprinting
      • Heating plate(s)
      • Cooling plate(s)
    • Optional processes:
      • Fully automated overlay alignment
      • UV curing
      • Inktjet printing
      • Scatterometry imprint quality control
    • Control software:
      • Fully automatic and semi-automatic mode
      • Individual flow for each substrate or cassette for process development or evaluation
      • Library function for station recipes and flows
      • All process parameters shown on the touchscreen
      • Real time wafer counter on the touchscreen
      • User management
      • Logging of all relevant process parameters linked to wafer ID
      • Error tracking history
    • SECS /GEM integration (option)
    • Remote connection possibility for maintenance and error, sensor logging
  • FabSCIL
    Fully automatic nano-imprint tool for creating high-quality nano- and micro-structures using the unique SCIL imprint technology....

  • Key features

    • Integration of all essential proces steps in one closed coupled system
    • Compact tool with minimal floor space in cleanroom and gray area
    • Tri-layer stamp construction allows conformal contact printing even on non-flat surfaces
    • Unique SCIL imprint process ensures sub 10 nm resolution with low pattern deformation and no stamp damage by particles
    • Fully automated overlay alignment (same surface and front-to-backside) with better than +/- 1 µm in X,Y
    • The excellent etch properties of the sol-gel resist result in high selectivity and etch rates
    • The thermal stability, optical transparency and (UV) stability of the sol-gel makes it suitable as functional layer in devices
    • Use of NanoGlass sol-gel based imprint material increases stamp lifetime.
    • Integrated UV curing for UV activated NIL resists
    • Imprint system open to all compatible imprint material systems
    • Overall combining highest imprint quality and yield with low total cost of ownership

    Description

    • Tool designed for SCIL soft-composite-stamp conformal imprinting
    • Integrated processes:
      • Robot handling
      • Rotational wafer alignment towards notch or flat
      • Wafer centering
      • Spin-coating
      • SCIL soft stamp nano-imprinting with overlay alignment better than +/- 1 µm in X,Y
      • UV curing
      • Post cure: heating + cooling plate
    • Optional processes that can be integrated:
      • Wafer flipping
      • Wafer buffer
      • Additional spin coater(s)
      • Inktjet printing
      • Additional heating and cooling plates
      • Scatterometry imprint quality control
    • Control software:
      • Fully automatic mode
      • Semi-automatic mode for e.g engineering and service
      • Individual flow for each substrate or cassette for process development or evaluation
      • Library function for station recipes and flows
      • User management
      • Logging of all relevant process parameters linked to wafer ID
      • Error tracking history
      • Software package including:
        • Software for recipe writing and system operating (start of handling, first wafer of cassette interlocked until process parameters like hotplate temperature are according to recipe setting)
        • Programmable user levels
        • Logfile storage and management with analyzing tool
        • All process parameter shown on the touchscreen
        • Wafer counter on real time for each wafer on the screen
        • SECS /GEM integration (option)
    • Process control computer including system operation HMI
    • Touch display for visualization, keyboard, mouse and barcode scanner
    • Signal light tower for visual and acoustical system status signals
    • Remote connection possibility for maintenance and error, sensor logging