Next Generation of Vapor Delivery Solutions for CVD and ALD
Better Vaporization, Higher Throughput, Less Waste
The MSP Turbo II™ Vaporizers offer enhanced throughput by delivering higher vapor concentrations, enabling faster deposition and etch rates. When paired with the MSP Turbo™ Liquid Flow Controller (LFC), this system provides fast response times, reducing both liquid waste and wafer processing durations.
Compact Design: Through advanced fluid dynamic and thermodynamic research, MSP has doubled vapor output while reducing the size of the heat exchanger by 50%. This breakthrough demonstrates Moore's law in vaporization technology.
Highly Stable Output: Turbo II™ Vaporizers deliver highly stable vapor concentrations, making them ideal for sensitive processes like PECVD. Their consistent vapor delivery ensures reliable, long-term field performance.
Extended Lifetime: Built to last the lifetime of the system, the MSP Turbo II™ Vaporizers are designed as durable components rather than consumables, contributing to overall tool longevity.
Lower Cost of Ownership: With their long lifespan, increased throughput, and reduced liquid waste, Turbo II™ Vaporizers lower the total cost of ownership. They also require less maintenance compared to other vaporizer solutions, leading to further cost savings.
Flexible for Diverse Liquids: These vaporizers accommodate a wide range of liquids, including difficult precursors with low vapor pressure or those with narrow thermal decomposition windows, ensuring flexibility in various applications.
Advanced Vaporization Technology: Using droplet vaporization and direct liquid injection (DLI), Turbo II™ Vaporizers provide stable, uniform vapor essential for high-quality thin films and improved wafer yields in thin film applications.