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住友重機械イオンテクノロジー

品川区,  東京都 
Japan
https://shi-ion.jp/
  • 小間番号W1369

住友重機械イオンテクノロジー株式会社(SMIT)では、最先端の半導体デバイスの製造に対応した高電流・中電流・高エネルギーのイオン注入装置と、レーザシステムに関する開発、製造、販売、サービスを提供しています。また、住友重機械工業株式会社は、フランスの最先端レーザアニール装置を専門とするLaser Systems & Solutions of Europe SASU(LASSE)の全株式取得を完了いたしました。LASSE社商品については、住友重機械イオンテクノロジー株式会社(SMIT)にて取り扱いをしております。

 出展製品

  • SAion
    All-in-one implanter with flexibility in applications that combine medium-current and high-current technologies ...

    • Framework that integrates high-current(HC) and medium-current(MC) ion implanters
    Energy range:Min.0.2keV / Max.630keV
    RF shower systems
    Improved productivity and particle reduction through the adoption of a new transportation system
    Low metal contamination
    Improved speed and quality of beam angle measurement as a result of adopting a new angle measuring system
    High beam current and wide energy range
    Hot Implantation (Option)
  • MC3-ⅡGP
    A state-of-the-art, high-performance MC3-II medium-current ion implanter which pursues a high level of implantation quality in the world...

    • Heavy ion implantation capability
    High-speed beam setup
    Increased multiple charge ion beams
    High reliability, high maintainability
    High mechanical throughput
    Low metal contamination
  • SS-UHEⅡ
    High-energy ion implantation equipment responding to the demands of the global image sensor market...

    • Wide energy range (200keV-14400keV)
    Low divergence angle beam
    Low metal contamination
    High beam angle accuracy
    Adoption of a control system to ensure High future scalability and maintainability
    An updated auto beam setup function
    Equipped with updated data analysis tools
    User-friendly visual design and operability
  • SWA-20US
    Efficient solid laser annealer for next generation power devices...

    • Galvano scan method achieves high throughput
    Excellent annealing uniformity with tophat mode beam
    Process atmosphere control(O2≦100ppm)
    Various monitoring function
    Thin wafer handling down to 50μmt
    Compatible with manual equipment for R&D usage
    Remote monitoring function(Option)
  • SWA-90GDA
    High-performance laser annealing equipment for deep activation...

    • Deep activation. Enables 7μm activation
    Process monitoring function for IR/Gr laser
    Proton activation available
    Excellent pulse energy stability. Rs Uniformity σ≦1% is achieved
    Amazing up-time is achieved by the maintenance free solid state laser
    Thin wafer handling down to 50μmt
    Remote monitoring function(Option)

Categories

202 装置、一般用途
  • 加熱/アニール/キュア装置-拡散炉/搬送装置/オーブン/テストチャンバー/熱処理
    • 207 装置、プロセス
  • イオン注入装置
    • 700 製造サービス
  • イオン注入サービス
  • 中古；レンタル装置、在庫低減化、鑑定評価-ブローカー/転売業者
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