Axcelis Technologies

The Purion H200 is our state-of-the-art single wafer high current medium energy implanter and the only true high current medium energy tool on the market. It has the industry’s widest energy range, from 10keV to 230keV. The Purion H200 combines high current power with medium current precision using advanced beamline technology from Purion H and high energy capabilities from Purion M.

Our Purion XE series of ion implanters have rapidly earned a reputation as the industry standard for today’s demanding high energy recipes. Their unique RF Linear Accelerator (LINAC) technology offers higher reliability, a wider energy range and greater productivity than competing platforms, with superior metals contamination control.

The power device market is one of the fastest growing segments in IC manufacturing, due in part to the robust growth in the e-mobility and renewable energy markets. Axcelis is the only implant supplier in the industry to offer a comprehensive solution to our power device manufacturing customers. The Purion Power Series+TM family is uniquely suited to excel at these applications due to its innovative platform that offers the flexibility to handle multiple wafer sizes (150mm, 200mm and 300mm), various substrate types (including SiC, Si, GaN, and GaAs wafers) and at various implant temperatures (room temperature, warm and hot). This is all accomplished while delivering the industry’s highest throughput and capital efficiency. The Purion Power Series+ covers the full ion implant market space with the Purion H Purion Power Series for high current applications, the Purion H200+ Power Series for high current medium energy applications, Purion M+ Power Series for medium current applications and the Purion XE Power Series for high energy applications.