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Schunk Xycarb Technology

  • 小間番号W1578


Welcome to Schunk Xycarb Technology!

Schunk Xycarb Technologyは、半導体、LED、太陽光発電業界向けに、石英、黒鉛、セラミックス製の消耗部品を製造しています。また、欧州全域において石英部品のリファービッシュメント(再生)サービスも提供し、包括的なソリューションを展開しています。当社は、約600名の専門スタッフと専任のエンジニアリングチーム、R&D施設を擁し、コンピュータ、サーバー、LED照明、自動車、スマートフォン向けマイクロエレクトロニクスの製造を間接的に支えています。シュンク・グループの一員として、オランダ・ヘルモンドに本社を置き、欧州、米国、アジアに生産・販売拠点を展開。グローバルな供給体制と確かな技術力で、お客様の製造現場をご支援します。

Schunk Xycarb Technology produces high-tech consumable parts made of quartz, graphite and ceramics for the semiconductor, LED, silicon and solar industries. We also offer Si EPI and SiC EPI refurbishments, for a comprehensive one-stop-shop solution for customers worldwide.

With an international team of over 600 professionals, we indirectly contribute to the production of devices used in computers, servers, LED lights, cars, and smartphones.

Schunk Xycarb Technology is part of the Schunk Group, which employees more than 10,400 people in 26 countries. Schunk Xycarb Technology is headquartered in Helmond, the Netherlands. Additional production and sales facilities are located in Germany, the United States, China, Japan, South Korea, Singapore and Taiwan.

Dedicated engineering teams provide support to the fast-developing microelectronics industries. Our high-precision machining and coating capabilities meet the most demanding customer specifications. To fuel continued innovation and investment in new materials and technologies we have our own research & development facilities.

We aim to serve customers to the highest standards of collaboration and efficiency. With a global network of sales and distribution, we offer customers localised service and support. All our activities are geared towards providing Pure Excellence.


 出展製品

  • Centura® chamber
    Material: SiC-Coated Graphite & Quartz Application: Si-based epitaxial deposition Platform: Applied Materials Centura®...

  • Characteristics: 
    • Stable and better uniformity during lifetime
    • Proven record of performance in the highest technology nodes
  • RTP ring
    • Material: Silicon-coated SiC • Application: Rapid Thermal Processing (RTP)...

  • Characteristics: Steady & uninterrupted supply of HVM quantities
  • SiC Ring
    Material: Solid CVD SiC • Application: Single-wafer SiC Epitaxial Deposition...

  • Characteristics: Steady & uninterrupted supply of HVM quantities
  • Single wafer SiC epitaxial reactor
    • Material: CVD SiC Coated Graphite • Application: Single-wafer Si Epitaxial Deposition...

  • • Characteristics: Steady & uninterrupted supply of HVM quantities. World class SiC coating technology
  • TaC disc
    Material: TaC Coated Graphite Application: SiC Epitaxy and SiC crystal growing TaC coating has a melting point ~3,880 °C which allows for: 3880°C...

  • - Easy removal of parasitic SiC in SiC Epi 
    - Reduces cost of ownership due to longer life