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Sumitomo Heavy Industries Ion Technology

Osaki 2-chome, Shinagawa-ku,  Tokyo 
Japan
https://shi-ion.jp/
  • Booth: W1369

Sumitomo Heavy Industries Ion Technology Co., Ltd.(SMIT) is engaged in development, manufacture, sales, and services related to ion implanters and laser system.

Please visit Sumitomo Heavy Industries Ion Technology Co., Ltd. for more information.

 Products

  • SAion
    All-in-one implanter with flexibility in applications that combine medium-current and high-current technologies ...

    • Framework that integrates high-current(HC) and medium-current(MC) ion implanters
    Energy range:Min.0.2keV / Max.630keV
    RF shower systems
    Improved productivity and particle reduction through the adoption of a new transportation system
    Low metal contamination
    Improved speed and quality of beam angle measurement as a result of adopting a new angle measuring system
    High beam current and wide energy range
    Hot Implantation (Option)
  • MC3-ⅡGP
    A state-of-the-art, high-performance MC3-II medium-current ion implanter which pursues a high level of implantation quality in the world...

    • Heavy ion implantation capability
    High-speed beam setup
    Increased multiple charge ion beams
    High reliability, high maintainability
    High mechanical throughput
    Low metal contamination
  • SS-UHEⅡ
    High-energy ion implantation equipment responding to the demands of the global image sensor market...

    • Wide energy range (200keV-14400keV)
    Low divergence angle beam
    Low metal contamination
    High beam angle accuracy
    Adoption of a control system to ensure High future scalability and maintainability
    An updated auto beam setup function
    Equipped with updated data analysis tools
    User-friendly visual design and operability
  • SWA-20US
    Efficient solid laser annealer for next generation power devices...

    • Galvano scan method achieves high throughput
    Excellent annealing uniformity with tophat mode beam
    Process atmosphere control(O2≦100ppm)
    Various monitoring function
    Thin wafer handling down to 50μmt
    Compatible with manual equipment for R&D usage
    Remote monitoring function(Option)
  • SWA-90GDA
    High-performance laser annealing equipment for deep activation...

    • Deep activation. Enables 7μm activation
    Process monitoring function for IR/Gr laser
    Proton activation available
    Excellent pulse energy stability. Rs Uniformity σ≦1% is achieved
    Amazing up-time is achieved by the maintenance free solid state laser
    Thin wafer handling down to 50μmt
    Remote monitoring function(Option)

Categories

202 Equipment, General Use
  • Heating; Annealing; Curing Equipment - Furnaces; Conveyors; Ovens; Test Chambers; Heat Treating
    • 207 Equipment, Process
  • Ion Implantation Equipment
    • 700 Manufacturing Services
  • Ion Implant Service
  • Used; Rental Equipment; Inventory Reduction, Appraisal - Brokers; Resellers
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