The NANOFABRICATOR® LITE is the most versatile tool ever created for material and process innovation, as well as device prototyping, with atomic precision. It features localized Direct Atomic Layer Processing (DALP®) technology, which utilizes a proprietary microchemical ALD reactor to enable unparalleled control and flexibility in material deposition, etching, and doping processes.
DALP® allows processing one atomic layer of material at a time, precisely in predefined patterns and areas. This process supports direct patterning across a wide range of surfaces and substrates, including semiconductors (Si, SiC, GaAs, Sapphire, InP, SiGe, Ge), glass, polymers, ceramics, and metals.
With the ability to load up to 3 different precursors and 3 reactants simultaneously, the NANOFABRICATOR LITE enables rapid material and process testing, gradientbased deposition, and rapid design of experiments and device prototyping, reducing R&D timelines from months to weeks. It features integrated software with a streamlined workflow, a user-friendly interface, and industry-standard file formats (GDS-II and DXF), allowing users to design, preview, and adjust structures in real time for faster innovation and adoption.