TSI

The TSI Nano LPM™ (Liquid Particle Monitor) System delivers true 10 nm nanoparticle detection in ultrapure water (UPW), essential for advanced semiconductor manufacturing. 

Using a patented aerosolization technique, UPW is transformed into droplets, dried, and solid particles are isolated. These particles are then measured by a water-based Condensation Particle Counter (CPC), designed for cleanroom compatibility. 

The Nano LPM ensures real-time, continuous monitoring of UPW, enabling early detection of contamination events and process anomalies. Engineering and quality teams gain reliable data to support quick, informed decisions. With consistent performance and high sensitivity, the Nano LPM™ sets the standard for UPW particle monitoring in nanometer-scale process environments.

The TSI AeroTrak™ Portable Particle Counter Model 9110 provides highly accurate particle detection down to 0.100 µm, enabled by patented, low-maintenance HeNe laser technology with an enhanced signal-to-noise ratio. Designed for demanding environments, it is ideal for ISO 14644-1 classification of Class 1 and 2 cleanrooms, cleanroom and process tool monitoring, and filter testing. 

The Model 9110 supports pass/fail reporting with an onboard printer and comes with TrakPro™ Lite Secure software for data download. Users can store and upload multiple configurations with ease. This versatile unit functions as a standalone device or can be integrated into a facility monitoring system, such as TSI’s FMS 5. The 9110 meets ISO 21501-4 requirements and is calibrated with NIST-traceable PSL spheres using TSI’s high-precision Classifier and Condensation Particle Counters, ensuring reliability and compliance in critical environments.

MSP Turbo II™ Vaporizers are engineered using cutting-edge droplet atomization science and a Direct Liquid Injection (DLI) method to meet the evolving demands of modern vaporization applications. 

With a compact design—just half the size of previous models—they deliver up to 200% more vapor output. This performance boost enables stable, uniform vapor delivery, leading to higher-quality thin films and improved wafer yields in semiconductor manufacturing. The clog-resistant design ensures precise control and allows the use of challenging precursors that were previously incompatible, unlocking new process possibilities. The result is extended, stable operation with reduced maintenance, less downtime, and significant cost savings for users. 

MSP Turbo II™ Vaporizers set a new standard for reliable and efficient vapor delivery in advanced material processes.