Kookje Electric Korea Co., Ltd.

Chung Cheong Nam Do, 
Korea (South)
http://www.kekorea.co.kr
  • Booth: 2622


The Professional Provider for Diffusion Furnace & LP-CVD

- The Professional Provider for Diffusion Furnace & LP-CVD System - The Leading Company of Batch Type ALD, Radical Oxide for Next Generation


 Products

  • Semiconductor Equipment

    1. LP-CVD/Diffusion Furnace
    2.BCD (Balanced Control Deposition)

    1.PIO (Plasma Isotropic Oxidation) ...

  • <Batch type>
    1. LP-CVD/Diffusion Furnace
    - High Throughput [Max 150wfs/Batch]
    - Process for SiO2, Si3N4, Poly-Si, Annealing etc.
    2. BCD (Balanced Control Deposition)
    - Low temperature Thin Film Deposition.
    - Complete step coverage & pattern dependency Free.
    - High Throughput [Max 150wfs/Batch]
    - Process for SiO2, Si3N4, High-k, Low-k, TiN etc.


    <Single Type>
    1. PIO (Plasma Isotropic Oxidation)
    - High Throughput [Max 135wfs/hr]
    - Plasma With Excellent Uniformity
    - High Temperature Plasma Process
    - Process for PIO, PIN, PIH etc.