AMETEK Korea Co., Ltd.

Suwon-shi, Gyeonggi-do, 
Korea (South)
http://www.ametek.com
  • Booth: 1280


Welcome to Diverse AMETEK solutions -Metrology & Analysis

AMETEK, Inc. is a leading global manufacturer of electronic instruments and electromechanical devices. AMETEK has approximately 11,600 colleagues working at more than 100 manufacturing facilities and more than 100 sales and service centers in the United States and around the world.


 Products

  • CAMECA - LEAP
    CAMECA innovation has delivered its new, cutting-edge atom probe microscope offering increased detection efficiency across a wide variety of metals, semiconductors and insulators: more than 40% extra atoms detected per nm3 analyzed! ...

  • 1. Application

    -. Analysis of Si-based device structures

    -. Composition measurement and analysis of cluster formation

    -. Characterization of composition and morphology as a function of micro-structural evolution

    -. Analyses of QW and QD-based device structures

    -. QW composition measurement and analysis of Indium cluster formation

    -. Defect analysis

    -. Dopant mapping in semiconductor device structures

    -. Concentration profile

    -. Characterization of nanowire devices

  • CAMECA - SIMS
    IMS Wf is a fully automated ion microprobe with benchmark performance in semiconductor ultra low energy depth profiling. It fulfills an increasing demand for monitoring of surface contamination in ultra shallow implants and thin layers. ...

  • 1. Utilization

    -. Ultra Thin Semiconductor SIMS Solution

    2. Application

    -. Ultra shallow & Deep Implants

    -. Surface & Interface contamination

    -. Junction depth mapping

  • Fischione - SEM-Mill (Ion milling machine)
    * Ion milling preparation for analyzing the SEM samples surface and cross section
    * Use Inert gas, typically argon
    - No reaction with the sample
    - No damage to the sample
    - Precise preparation available
    - Producing high quality image available ...

  • * The milling instrument irradiating argon ion beam to sample surface and cross section.

        - Inert gas, typically argon gas will be converted reactive gas.

        - Converted argon cation (Ar+) is focused on Ion Gun.

        - The focused beam is irradiated to the sample.

       * More easy contaminants analysis and defect analysis by removing the organic film of sample surface.

       * This instrument can produce high quality data and increase milling rate.

          - By using two ion sources

          - Continuously adjustable milling angle range 0° to 10°

          - Variable Ion accelerating voltages from 100eV to 6.0KeV

          - Sample rocking/rotation function make it possible to set a wide variety of conditions

            in the event that the sample preparation is difficult

        * Very convenience

          - Sample size available is up to 25mm diameter x 15mm high

          - Touch Screen method

        * Cheap maintenance  

          - No use consumables (Blade and so on.)

       * Shorten sample transfer time by using air lock system to improve efficiency.

  • EDAX - Octane Elite Silicon Drift Detector (SDD)
    SDD offers a new Si3N4 window, for up to a 35% increase in sensitivity for light element detection and low kV microanalysis, and latest CUBE technology for high speed X-ray data processing in a fully vacuum encapsulated detector device. ...

  • The game changing advancements in the Octane Elite Silicon Drift Detector (SDD) Series take detector technology to the next level. This line of detectors incorporates a new silicon nitride (Si3N4) window, which offers remarkable improvements in low energy sensitivity for light element detection and low kV microanalysis. The Octane Elite Series also uses the widely praised CUBE technology, which yields high speed X-ray data processing within a smaller and fully vacuum encapsulated detector device.

    The transmission improvements of the silicon nitride window can be as much as 35% compared to a polymer window, leading to greatly improved light element performance and significantly more critical data for the materials analyst.

    When spectra acquired from a silicon dioxide sample at 10 kV using both a polymer and a silicon nitride window are scaled to the same peak amplitude at the Si K peak to facilitate comparison a clear improvement for the results from the Si3N4 window is seen in the increased oxygen peak intensity.

    Low kV performance

    The mechanical properties of Si3N4 allow the windows to be very thinly fabricated, offering a great benefit in terms of sensitivity, enabling optimal low voltage analysis.

    Reliability

    The material properties and durability of Si3N4 ensure the most robust and reliable detectors available for all EDS applications.

    Features and Benefits

    Si3N4 window

    • Thermal resistance enables in-situ testing and analysis
    • Corrosion and shock resistance
    • Higher sensitivity for superior low kV performance
    • Unique grid arrangement blocks fewer X-rays
    • Vacuum encapsulation maximizes low energy collection
    • Can be plasma cleaned to reduce contamination build-up

    Use of CUBE Technology

    • Electronics are available on a smaller module
    • Achieves lower temperatures using less power for better resolution
    • Offers the fastest pulse processing available
    • Maps can be collected in much shorter times, boosting user productivity

    Al L to Al K peak height ratio of 1:1 at 2.5 kV

    Stable energy resolution at high collection speeds

    • Data quality guaranteed at all count rates
    • Extraction of high-resolution quantitative analysis at mapping speeds up to 200,000 cps

    TEAM™ Software Suite allows users to optimize their analysis time and get the best possible data from their sample

    • Smart Diagnostics and Smart Acquisition facilitate optimized collection and analysis conditions
    • Smart Pulse Pile-Up Correction minimizes concerns typical of high count rate collections and allows maximum use of SDD technology

     Conclusion

    The design enhancements and analytical benefits of the Octane Elite Series advance SDD technology to the highest level of performance ever achieved in a commercially available EDS detector. They enable users to meet more of their materials characterization challenges with the best results.

  • TMC - STACIS® III & Everstill™
    1) STACIS® III : Active Vibration Cancellation System
    2) Everstill™ : Active Vibration Cancellation Platform

    ...

  • TMC designs and manufactures a complete line of passive and active pneumatic and piezoelectric vibration control systems. STACIS® is the world’s most advanced vibration cancellation system with an active bandwidth from 0.6 Hz to 150 Hz. Quiet Island ™ sub-floor platforms provide vibration isolation for sensitive lithography, inspection, and metrology equipment in a raised-floor environment.  SEMBase™ is idea for Scanning Electron Microscopes.  And, Everstill™ is a compact active vibration cancellation platform for small, bench-top instruments.

     

    STACIS® III

    Active Vibration Cancellation System

    STACIS® III, our next generation active piezoelectric vibration cancellation system, features a faster and more robust digital controller–the DC-2020–providing semiconductor tool owners and researchers with a simple, easy-to-use graphical user interface.

     

    Everstill
    Active Vibration Cancellation Platform

    Everstill™ K-400 benchtop vibration cancellation platform incorporates a “serial type” active architecture and velocity sensors to isolate ultra-precision instruments. It excels in the critical 1-10 Hz range where instruments tend to be most sensitive.