K-SPEED is a computer simulation software to predict feature evolution considering the physicochemical phenomena of etching and deposition process of semiconductor and display industry such as void, etch stop, polymer passivation effect, etch rate, and charge-up effect.
To predict the bulk plasma property of various processing gas
To predict the surface reactions between wafer surface and plasma
To predict the transport of ions and neutral species in microstructure of semiconductor
To predict the movement of 3D free surface in plasma processing