High Integrated Technology, Inc.

PyeongTaek-City,  Gyeonggi-Do 
Korea (South)
  • Booth: A544

It will be enterprise which think first.

Designs and manufactures Wet station & FPD cleaner, D.I water heating systems, and related equipment in the field of semiconductors. 

Equipment: Wet Station, Tube Cleaner, Parts Cleaner, D.I Water heating system, Overseas product Gas Detector, Chemical Circulator, Leak & Level Sensor, etc.

Gas Business : specialty gas & utility piping, engineering & management,

Jungle box & gas panel manufacturing and installation in the field of LCD & semiconductors


  • Chemical Circulator
    Direct circulation type chemical isothermal device indispensable for wet process b contamination free in-line type cooling/heating unit....

  • Chemical Circulator는 RCA 세정과 습식 식각에 쓰이는 화학 약품의 정확한 온도 조절에 사용한다.
    이것은 반도체 제조의 습식 공정에 폭넓게 사용되는 없어서는 안 될 요소이다.
    이 Chemical Circulator는 최근 화학약품의 다양화와 더 높은 메가비트들의 청결함 요구의 증가를 충족시키기 위해 새롭게 소개되었다.
    *고온 화학품의 사용에는 CS-Heater를 권합니다.

    이용 예시

    모델 사진


  • GD-D58 series
    Drawing pump of large flow rate built-in. Flow rate decreasing detector sensor installed. Easy maintenance owing to unitizing components to be exchanged periodically....

  • 사양

    검지 가스 가연성 가스
    방폭 구조 내압 방폭구조
    인증 ATEX, CE, TIIS
    치수 & 무게 약 197(W) X 286(H) X 140(D)mm, 약 5.8kg
  • GD-70D
    GD-70D series is a gas detector head to detect toxic gas, oxygen, and combustible gas generated at semiconductor and liquid crystal factory, etc....

  • 특징

    모든 검지 방식에 대한 공통 플렛폼 (본체/센서/센서) 
    다기능적인 센서 유닛 (New Intelligent Sensor)  
    내부 튜브 / 코일 없음  
    전면에서 유지보수 / 공구 불필요 / 손쉬운 센서 및 펌프 교체 
    다양한 통신 방식 (4~20mA, NT, PoE)  
    향상된 트러블슈팅 펌웨어 기능을 통한 최소한의 유지보수 비용


    태양전지, 반도체 및 LCD산업용 가스 검지 모니터링


    카테고리 고정식 가스 검지기
    타입 독립형 가스 검지기
    검지 가스 독성, 가연성, 산소
    검지 원리 센서 유닛에 따라 변동
    샘플링 타입 흡입식
    알람 디스플레이 1차 알람 / 2차 알람 / 트러블 알람
    인증 RoHs, CE
    전원 DC24V±10%, 약 1.5W (센서 유닛 포함 최대 4W)
    주석 : 약 2.5W (SGU 센서 유닛 포함 최대 5W)
    치수 & 무게 70(W) x 120(H) x 150(D) mm, 약 0.9kg
    동작 온도 & 습도 0 ~ 40℃, 30 ~ 80%RH (응결 없이)
  • Wet Station
    Wafer 표면 세정 설비로 다양한 공정에 대응 가능 하다...

  • ■ HWC-ACP (Auto Wet Station)

     - Wafer 표면 세정 설비로 다양한 공정에 대응 가능 하다
     - Wafer Size ++: 150mm ~ 200mm [ 2Cassette Type ]
     - Process Direction : From left to right / From right to left
     - Robot System : 2 ~ 4set [ Robot safety interlock ]
     - Front Door : Slide open type
     - Chemical Supply : CCSS or LCSS type
     - Control method : PC or PLC control / Scheduler control
     - Application field

           RCA cleaning                    Particle removal

           Nitride film removal         Oxide film removal

           Polymer removal              Resist Strip Station

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