Jesagi Hankook Ltd.

Korea (South)
  • Booth: BS16

Welcome! This is Jesagi Hankook.

Since founded in 1991. Jesagi Hankook Ltd., have been striving only for developing and commercializing of new technology with Plasma Systems

Especially, we are focusing on development of plasma process and manufacturing of plasma systems of PVD, PECVD, Cleaning, Etching and Surface Modification which are very necessary for the Semiconductor, PCB, and Display industries, and have supplied our plasma systems to world-leading companies.

Also, we always try to make a practical technology and product via unlimited technical collaborations with leading experts

and organizations as well as making experiments based on new theory with our own for extension of applications.

We believe that the technology development helpful for human race can be achieved only through open and broad minded attitude.

Jesagi Hankook Ltd., now give our word that we will do our best to be remained as a world-top company which last and

progress ever in the history of development of new technology for the better future.


  • JSPES-W300A
    Wafer Plasma Cleaning & Descum System Automatic Wafer Plasma Cleaning, Ashing and surface Modification. One or Two Cassettes, FOUP Model Available...

  • JSPES-W300A & JSPES-W300A1 시스템은 반도체 Back-End 공정중 Wafer를 대상으로 처리하는   Wafer Cleaning & Etching Plasma System 입니다

    300mm ( 12" ) 또는 200mm ( 8")  Wafer  표면의 유기물등 이물질을 제거하거나  EMC Molding    처리 전  후 접착력 향상을 도모해  주며  회로 패턴 형성시 식각후 남아있는 잔사를 제거해 주는 등 안전하고 확실하며 실속있는  Wafer Level  Plasma  System 입니다.

    확실한 성능과 안정적인 균일성을 구현하며       여러 Wafer Carrier (  12"  FOUP,  FOSB 그리고 8" Casette )들을 함께 적용하여 목적에 따라 Wafer 표면을 확실하게 처리 합니다.  또한 300mm ( 12" )  FOUP Base 상태에서  FOUP 내부에 200mm ( 8")  Stage 을 삽입한 12" FOUP으로 200mm ( 8" ) Wafer를 처리  할 수 있게 지원 가능 합니다.

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