Wonik IPS Co., Ltd.

Pyeongtaek-si, Gyeonggi-do, 
Korea (South)
  • Booth: A218

Since its foundation in 1991, WONIK IPS has been greatly contributed to Korea's semiconductor equipment industry with its continuous R&D and customer satisfaction based management.. In our initial business, we domestically produced and provided the Gas Cabinet, the utility facilities to our customers, then challenged the domestically produced the all- process semiconductor equipments to successfully develop PE-CVD in 2002. This has been so far the considerable performance providing for Korea's leading element companies. We also branched out to the special gas industry for semiconductor/LCD with successful market entry and then extended sales and growth. When the development is successful and applied to the customers' mass production, it is expected to greatly contribute to the extended sales. WONIK IPS will make our continuous efforts to get the competitive edges and improvement in Korea's semiconductor business, by stepping up to the best level of technology through more intensified R&D.


    GEMINI CVD System...

  • GEMINI CVD SYSTEM 은 Anti-Reflective Coating 및 Hardmask 와 같은 PECVD(Plasma-Enhanced Chemical Vapor Deposition) 기술을 사용하여, Dielectric Film 을 생산합다. PECVD System 은 ALD(Atomic Layer Deposition) 을 사용한 것과 같은 우수한 균일 성능을 사용자에게 제공하며, GEMINI a-Si Film 은 20nm 이하의 향상된 DRAM 공정 및 Logic Device 를 위한 DPT/ QPT Hard Mask Patterning 솔루션에 널리 사용됩니다. 무엇보다도 GEMINI PECVD 의 Dielectric Film 은 세계 최고 수준의 균일성으로 잘 알려져 있으며 생산성이 뛰어나고 고장율이 낮아 투자 및 관리 비용을 크게 절감할 수 있습니다.

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