Hansol Chemical Co., Ltd.

Seoul, 
Korea (South)
http://www.hansolchemical.com
  • Booth: B202


We invite you to a Semicon and precursor specialized company

Hansol Chemical was established in 1980 and began manufacturing Hydrogen Peroxide for the paper, textile  and semiconductor industries from its central plants in Jeonju and Ulsan. Since then, our line of specialty products have expanded ranging from a variety of fine chemical technologies and businesses including Latex, Papermaking chemicals, Polyacrylamide, SD and BPO to Electronic Materials technologies and businesses such as Thin Film Materials and precursors for semiconductor and Electronic Materials.

In our relentless drive to become a world leader in the 21st Century, we commit ourselves to excellence in creating new products, developing technology, exploring new markets, and discovering new business.


 Products

  • Silicon precursor
    BDEAS(Bisdiethylaminosilane) DIPAS(Diisopropylaminosilane) BTBAS(Bistertbutylaminosilane) 3DMAS(Trisdimethylaminosilane) HCDS(Hexachlorodisilane) TSA(Trisilylamine)...

  • TSA(Trisilylamine)

    - Semiconductor middle temp Gap fill

    - Flowable CVD, Low temp SiO2, SiN

    BDEAS(Bisdiethylaminosilane)

    - Semiconductor Low Temp ALD SiO2(DPT, QPT)

    - NAND Si seeding


    DIPAS(Diisopropylaminosilane)

    - Semiconductor Low Temp ALD SiO2(DPT, QPT)

    - NAND Si seeding


    HCDS(Hexachlorodisilane)

    - Semiconductor Middle temp SiO2

    - Logic Middle temp spacer, SiN

    3DMAS(Trisdimethylaminosilane)

    - Semiconductor Middle temp SiO2

    - NAND slit oxide, sealing oxide


    BTBAS(Bistertbutylaminosilane)

    - Semiconductor Middle temp SiN/SiO2

  • Metal precursor
    Co precursor Ru precursor W precursor...

  • Co precursor(CpCo(CO)2, CCTBA)

    - Sys LSI Liner for Co capping, metal line

    - Metallic Co, CoSi and CoN thin film

    Ru precursor

    - Volatile liquid precursors for metallic Ru

    - Metallic Ru film by ALD process

    W precursor

    - NAND gate electrode on <10nm metal plug

  • High-k precursor
    Zr precursor Hf precursor Ti precursor Al precursor...

  • Zr precursor

    - ALD process at high temperature for ZrO2 film

    - Fast saturation, Excellent step coverage

    Hf precursor

    - ALD process at high temperature for HfO2 film

    - Fast saturation, Excellent step coverage

    Ti precursor

    - ALD process at high temperature for HfO2 film

    - Reasonable GPC, wide ALD window and Excellent step coverage

    Al precursor

    - Non-pyrohporicity and high purity Al2O3

    - Wide ALD window and excellent step coverage

BEWARE - Special Warning Notice about ExpoGuide and FAIRGuide

With the ongoing solicitations, SEMI would like to continue to alert you with questionable professional practices perpetrated against exhibitors by FairGuide.com (Austria) and Expo Guide (Mexico), Event Fair - The Exhibitors' Guide with their misleading directory services. There may be others that we are not aware of and are hence not named here. 

These companies provide legitimate exhibition guides aimed at exhibitors across the globe offering online listing services. They use a form which resembles and organizer's free catalogue listing service, inviting exhibitors to complete the form for an entry in an on-line directory. Unsuspecting exhibitors who sign and return the form are then contracted into a three-year, non-retractable agreement, which could cost the exhibitor a significant amount of money, with very limited foreseeable benefits. The details are often available on the form itself, but are often too small and insignificant to be noticed. It is always wise to really the small print before signing a contract, and if the information is impossible to read then the contract should not be signed. These publications have no connection with SEMI or any of our events, and it is important that all companies are made aware of this. 

Should you receive any communication from the Expo-Guide and Fairguide.com or related company, please IGNORE THEM COMPLETELY and DO NOT COMMUNICATE WITH THEM IN ANY WAY.

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